Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists
Hayase, S., Nakano, Y., S.Yoshikawa, and, Ohta, H., Sato, Y., Shiobara, E., Miyoshi, S., Onishi, Y., Abe, M., Matsuyama, H., Ohiwa, Y.
Published in Chemistry of materials (01.06.2001)
Published in Chemistry of materials (01.06.2001)
Get full text
Journal Article