Critical curves in conformally invariant statistical systems
Rushkin, I, Bettelheim, E, Gruzberg, I A, Wiegmann, P
Published in Journal of physics. A, Mathematical and theoretical (02.03.2007)
Published in Journal of physics. A, Mathematical and theoretical (02.03.2007)
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Journal Article
Statistics of harmonic measure and winding of critical curves from conformal field theory
Belikov, A, Gruzberg, I A, Rushkin, I
Published in Journal of physics. A, Mathematical and theoretical (18.07.2008)
Published in Journal of physics. A, Mathematical and theoretical (18.07.2008)
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Journal Article
Harmonic measure of critical curves
Bettelheim, E, Rushkin, I, Gruzberg, I A, Wiegmann, P
Published in Physical review letters (21.10.2005)
Published in Physical review letters (21.10.2005)
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Journal Article
Global properties of stochastic Loewner evolution driven by Lévy processes
Oikonomou, P, Rushkin, I, Gruzberg, I A, Kadanoff, L P
Published in Journal of statistical mechanics (01.01.2008)
Published in Journal of statistical mechanics (01.01.2008)
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Journal Article
Stochastic Loewner evolution driven by Lévy processes
Rushkin, I, Oikonomou, P, Kadanoff, L P, Gruzberg, I A
Published in Journal of statistical mechanics (01.01.2006)
Published in Journal of statistical mechanics (01.01.2006)
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Journal Article
Synthesis and Characterization of the New Fluoropolymer Poly(difluorosilylenemethylene); An Analogue of Poly(vinylidene fluoride)
Lienhard, M, Rushkin, I, Verdecia, G, Wiegand, C, Apple, T, Interrante, L. V
Published in Journal of the American Chemical Society (10.12.1997)
Published in Journal of the American Chemical Society (10.12.1997)
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Journal Article
Fundamental Studies of Molecular Interactions and Dissolution Inhibition in Poly(norbornene-alt-maleic anhydride)-Based Resins
Houlihan, F. M, Dabbagh, G, Rushkin, I, Hutton, R, Osei, D, Sousa, J, Bolan, K, Nalamasu, O, Reichmanis, E, Yan, Z, Reiser, A
Published in Chemistry of materials (20.11.2000)
Published in Chemistry of materials (20.11.2000)
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Journal Article
Overview of the STORM program application to 193nm singe layer resists
Croffie, E., Cheng, M., Neureuther, A., Cirelli, R., Houlihan, F., Sweeney, J., Watson, P., Nalamasu, O., Rushkin, I., Dimov, O., Gabor, A.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Conference Proceeding
Fundamental Studies of Dissolution Inhibitors in Poly(norbornene-alt-maleic anhydride) Based Resins
Houlihan, F. M., Dabbagh, G., Rushkin, I., Hutton, R., Osei, D., Sousa, J., Bolan, K., Nalamasu, O., Reichmanis, E., Yan, Z., Reiser, A.
Published in Journal of Photopolymer Science and Technology (2000)
Published in Journal of Photopolymer Science and Technology (2000)
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Journal Article
Study of Base Additives for Use in a Single Layer 193nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate)
Houlihan, F.M., Person, D., Rushkin, I., Dimov, O., Reichmanis, E., Nalamasu, O.
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Overview of the STORM program application to 193nm single layer resists
Croffie, E, Cheng, M, Neureuther, A, Cirelli, R, Houlihan, F, Sweeney, J, Watson, P, Nalamasu, O, Rushkin, I, Dimov, O, Gabor, A
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing
Houlihan, F. M., Rushkin, I. L., Hutton, R. S., Timko, A. G., Reichmanis, E., Nalamasu, O., Gabor, A. H., Medina, A. N., Malik, S., Neiser, M., Kunz, R.R., Downs, D. K.
Published in Journal of Photopolymer Science and Technology (1999)
Published in Journal of Photopolymer Science and Technology (1999)
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Journal Article