Improvement of Interface Properties for Thermally Oxidized SiC/SiO2 MOS Capacitor by Post Oxidation Annealing Treatment
Chung, Surasit, Singh, Navab, Han, K.M., Roth, V.Q.G., Chand, Umesh, Bera, Lakshmi Kanta, Chua, Calvin Hung Ming
Published in Materials science forum (31.05.2023)
Published in Materials science forum (31.05.2023)
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