Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes
Murakami, Katsuhisa, Rommel, Mathias, Hudec, Boris, Rosová, Alica, Hušeková, Kristína, Dobročka, Edmund, Rammula, Raul, Kasikov, Aarne, Han, Jeong Hwan, Lee, Woongkyu, Song, Seul Ji, Paskaleva, Albena, Bauer, Anton J, Frey, Lothar, Fröhlich, Karol, Aarik, Jaan, Hwang, Cheol Seong
Published in ACS applied materials & interfaces (26.02.2014)
Published in ACS applied materials & interfaces (26.02.2014)
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Phase‐Dependent Phonon Heat Transport in Nanoscale Gallium Oxide Thin Films
Xiao, Xinglin, Mao, Yali, Meng, Biwei, Ma, Guoliang, Hušeková, Kristína, Egyenes, Fridrich, Rosová, Alica, Dobročka, Edmund, Eliáš, Peter, Ťapajna, Milan, Gucmann, Filip, Yuan, Chao
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Published in Small (Weinheim an der Bergstrasse, Germany) (01.05.2024)
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Structure and Thermal Stability of ε/κ-Ga2O3 Films Deposited by Liquid-Injection MOCVD
Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan
Published in Materials (01.01.2023)
Published in Materials (01.01.2023)
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Mg Doping of N-Polar, In-Rich InAlN
Kuzmík, Ján, Pohorelec, Ondrej, Hasenöhrl, Stanislav, Blaho, Michal, Stoklas, Roman, Dobročka, Edmund, Rosová, Alica, Kučera, Michal, Gucmann, Filip, Gregušová, Dagmar, Precner, Marian, Vincze, Andrej
Published in Materials (10.03.2023)
Published in Materials (10.03.2023)
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Substrate influence on low energy electron beam processing of YBa2Cu3O7−δ thin films
Bareli, Guy, Chromik, Štefan, Camerlingo, Carlo, Talacko, Marcel, Rosová, Alica, Španková, Marianna, Štrbík, Vladimír, Sojková, Michaela, Jung, Grzegorz
Published in Applied surface science (01.01.2021)
Published in Applied surface science (01.01.2021)
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InN crystal habit, structural, electrical, and optical properties affected by sapphire substrate nitridation in N-polar InN/InAlN heterostructures
Gucmann, Filip, Kučera, Michal, Hasenöhrl, Stanislav, Eliáš, Peter, Rosová, Alica, Dobročka, Edmund, Stoklas, Roman, Kuzmík, Ján
Published in Semiconductor science and technology (01.07.2021)
Published in Semiconductor science and technology (01.07.2021)
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Tuning the orientation of few-layer MoS2 films using one-zone sulfurization
Sojková, Michaela, Vegso, Karol, Mrkyvkova, Nada, Hagara, Jakub, Hutár, Peter, Rosová, Alica, Čaplovičová, Mária, Ludacka, Ursula, Skákalová, Viera, Majková, Eva, Siffalovic, Peter, Hulman, Martin
Published in RSC advances (2019)
Published in RSC advances (2019)
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Journal Article
Thermal stability of rhombohedral α- and monoclinic β-Ga2O3 grown on sapphire by liquid-injection MOCVD
Gucmann, Filip, Nádaždy, Peter, Hušeková, Kristína, Dobročka, Edmund, Priesol, Juraj, Egyenes, Fridrich, Šatka, Alexander, Rosová, Alica, Ťapajna, Milan
Published in Materials science in semiconductor processing (15.03.2023)
Published in Materials science in semiconductor processing (15.03.2023)
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Journal Article
Growth of N-polar In-rich InAlN by metal organic chemical vapor deposition on on- and off-axis sapphire
Hasenöhrl, Stanislav, Blaho, Michal, Dobročka, Edmund, Gucmann, Filip, Kučera, Michal, Nádaždy, Peter, Stoklas, Roman, Rosová, Alica, Kuzmík, Ján
Published in Materials science in semiconductor processing (15.03.2023)
Published in Materials science in semiconductor processing (15.03.2023)
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Journal Article
Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor
Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mi ušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, Karol
Published in Journal of physics. D, Applied physics (25.09.2013)
Published in Journal of physics. D, Applied physics (25.09.2013)
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Journal Article
Structure and Thermal Stability of ε/κ-Ga 2 O 3 Films Deposited by Liquid-Injection MOCVD
Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan
Published in Materials (20.12.2022)
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Published in Materials (20.12.2022)
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Structure and Thermal Stability of ε/κ-Ga[sub.2]O[sub.3] Films Deposited by Liquid-Injection MOCVD
Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan
Published in Materials (01.12.2022)
Published in Materials (01.12.2022)
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Journal Article
Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes
HUDEC, Boris, HUSEKOVA, Kristína, CHEOL SEONG HWANG, FRÖHLICH, Karol, TARRE, Aivar, HWAN HAN, Jeong, HAN, Sora, ROSOVA, Alica, LEE, Woongkyu, KASIKOV, Aarne, SEUL JI SONG, AARIK, Jaan
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
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Conference Proceeding
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In Sapphire Substrates by MOCVD
Rosová, Alica, Dobročka, Edmund, Eliáš, Peter, Hasenöhrl, Stanislav, Kučera, Michal, Gucmann, Filip, Kuzmík, Ján
Published in Nanomaterials (Basel, Switzerland) (01.10.2022)
Published in Nanomaterials (Basel, Switzerland) (01.10.2022)
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Journal Article
Tuning the orientation of few-layer MoS 2 films using one-zone sulfurization
Sojková, Michaela, Vegso, Karol, Mrkyvkova, Nada, Hagara, Jakub, Hutár, Peter, Rosová, Alica, Čaplovičová, Mária, Ludacka, Ursula, Skákalová, Viera, Majková, Eva, Siffalovic, Peter, Hulman, Martin
Published in RSC advances (19.09.2019)
Published in RSC advances (19.09.2019)
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Journal Article
Tuning the orientation of few-layer MoS films using one-zone sulfurization
Sojková, Michaela, Vegso, Karol, Mrkyvkova, Nada, Hagara, Jakub, Hutár, Peter, Rosová, Alica, aplovi ová, Mária, Ludacka, Ursula, Skákalová, Viera, Majková, Eva, Siffalovic, Peter, Hulman, Martin
Published in RSC advances (19.09.2019)
Published in RSC advances (19.09.2019)
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Journal Article
Impact of plasma treatment on electrical properties of TiO 2 /RuO 2 based DRAM capacitor
Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mičušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, Karol
Published in Journal of physics. D, Applied physics (25.09.2013)
Published in Journal of physics. D, Applied physics (25.09.2013)
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Journal Article