Fast Deposition Process for Graded SiGe Buffer Layers
Känel, Hans von, Rosenblad, Carsten, Kummer, Matthias, Müller, Elisabeth, Graf, Thomas, Hackbarth, Thomas
Published in Japanese Journal of Applied Physics (01.04.2000)
Published in Japanese Journal of Applied Physics (01.04.2000)
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Journal Article
Structural characterization of thick, high-quality epitaxial Ge on Si substrates grown by low-energy plasma-enhanced chemical vapor deposition
THOMAS, Shawn G, BHARATAN, Sushil, RAMM, Juergen, ISELLA, Giovanni, VON KÄNEL, Hans, JONES, Robert E, THOMA, Rainer, ZIRKLE, Thomas, EDWARDS, N. V, RAN LIU, XIANG DONG WANG, QIANGHUA XIE, ROSENBLAD, Carsten
Published in Journal of electronic materials (01.09.2003)
Published in Journal of electronic materials (01.09.2003)
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Journal Article