Cleaning and Strip Requirement for Metal Gate Based CMOS Integration
Schram, Tom, Farid, Sebai, Cleas, Martine, Vos, Rita, Wada, Masayuki, Albert, Johan, Rohr, Erika, Kubicek, Stefan
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
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Estimation of fixed charge densities in hafnium-silicate gate dielectrics
Kaushik, V.S., O'Sullivan, B.J., Pourtois, G., Van Hoornick, N., Delabie, A., Van Elshocht, S., Deweerd, W., Schram, T., Pantisano, L., Rohr, E., Ragnarsson, L.-A., De Gendt, S., Heyns, M.
Published in IEEE transactions on electron devices (01.10.2006)
Published in IEEE transactions on electron devices (01.10.2006)
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Low-frequency Noise Analysis of the Impact of an LaO Cap Layer in HfSiON/Ta 2 C Gate Stack nMOSFETs
Simoen, Eddy R., Akheyar, Amal, Rohr, Erika, Mercha, Abdelkarim, Claeys, C.
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
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Effectiveness of Nitridation of Hafnium Silicate Dielectrics: A Comparison Between Thermal and Plasma Nitridation
O'Sullivan, B.J., Kaushik, V.S., Everaert, J.-L., Trojman, L., Ragnarsson, L.-A., Pantisano, L., Rohr, E., DeGendt, S., Heyns, M.
Published in IEEE transactions on electron devices (01.07.2007)
Published in IEEE transactions on electron devices (01.07.2007)
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Challenges with Respect to High-k/Metal Gate Stack Etching and Cleaning
Vos, Rita, Arnauts, Sophia, Bovie, Inge, Onsia, Bart, Garaud, Sylvain, Xu, Kaidong, Hongyu, Yu, Kubicek, Stefan, Rohr, Erika, Schram, Tom, Veloso, Anabela, Conard, Thierry, Leunissen, Leonardus H.A., Mertens, P.
Published in ECS transactions (28.09.2007)
Published in ECS transactions (28.09.2007)
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Observation and characterization of defects in HfO 2 high- K gate dielectric layers
Kaushik, Vidya, Claes, Martine, Delabie, Annelies, Elshocht, Sven Van, Richard, Olivier, Conard, Thierry, Rohr, Erika, Witters, Thomas, Caymax, Matty, Gendt, Stefan De, Heyns, Marc
Published in Microelectronics and reliability (2005)
Published in Microelectronics and reliability (2005)
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Journal Article
Observation and characterization of defects in HfO2 high-K gate dielectric layers
KAUSHIK, Vidya, CLAES, Martine, HEYNS, Marc, DELABIE, Annelies, VAN ELSHOCHT, Sven, RICHARD, Olivier, CONARD, Thierry, ROHR, Erika, WITTERS, Thomas, CAYMAX, Matty, DE GENDT, Stefan
Published in Microelectronics and reliability (01.05.2005)
Published in Microelectronics and reliability (01.05.2005)
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Conference Proceeding
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Threshold Voltage Control in PMOSFETs with Polysilicon or Fully-Silicided Gates on Hf-Based Gate Dielectric Using Controlled Lateral Oxidation
Kaushik, Vidya S., Rohr, Erika, Hyun, Sangjin, De Gendt, Stefan, Van Elshocht, Sven, Delabie, Annelies, Everaert, Jean-Luc, Veloso, Anabela, Brus, Stephan, Ragnarsson, Lars-Ake, Richard, Olivier, Caymax, Matty, Heyns, Marc
Published in ECS transactions (07.07.2006)
Published in ECS transactions (07.07.2006)
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Alternative Gate Dielectric Materials
Van Elshocht, Sven, Hardy, An, De Gendt, S., Adelmann, Christophe, Baumann, Peter K., Brunco, David P., Caymax, Matty R., Conard, Thierry, Delugas, Pietro, Lehnen, Peer, Richard, Olivier, Rohr, Erika, Shamiryan, Denis, Vos, Rita, Witters, Thomas, Zimmerman, Paul, Van Bael, Marlies K., Mullens, Jules, Meuris, Marc M., Heyns, Marc M.
Published in ECS transactions (20.10.2006)
Published in ECS transactions (20.10.2006)
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Journal Article
Cleaning and Strip Requirement for Metal Gate Based CMOS Integration
Schram, Tom, Farid, Sebai, Cleas, Martine, Vos, Rita, Wada, Masayuki, Rohr, Erika, Kubicek, Stefan
Published in Meeting abstracts (Electrochemical Society) (10.07.2009)
Published in Meeting abstracts (Electrochemical Society) (10.07.2009)
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Journal Article
Challenges with Respect to High-k/Metal Gate Stack Etching and Cleaning
Vos, Rita, Arnauts, Sophia, Bovie, Inge, Onsia, Bart, Garaud, Sylvain, Xu, Kaidong, Hongyu, Yu, Kubicek, Stefan, Rohr, Erika, Schram, Tom, Veloso, Anabela, Leunissen, Leonardus H.A., Mertens, P.
Published in Meeting abstracts (Electrochemical Society) (28.09.2007)
Published in Meeting abstracts (Electrochemical Society) (28.09.2007)
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Journal Article
Threshold Voltage Control in PMOSFETs with Polysilicon or Fully-Silicided Gates on Hf-based gate dielectric using Controlled Lateral Oxidation
Kaushik, Vidya, Rohr, Erika, Hyun, Sangjin, DeGendt, Stefan, Van Elshocht, Sven, Delabie, Annelies, Everaert, Jean-Luc, Veloso, Anabela, Brus, Stephan, Ragnarsson, Lars-Ake, Richard, Olivier, Caymax, Matty, Heyns, Marc
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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