Novel single-wafer, single-chamber combined dry and wet system for stripping and in-situ cleaning of high-dose ion-implanted photoresists
Kim, Y. J., Yoon, C.R., Roh, E.S., Cho, J.K., Hattori, T.
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
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Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Conference Proceeding
Novel single-wafer, single-chamber combined dry and wet system for stripping and in-situ cleaning of high-dose ion-implanted photoresists
Kim, Y.J., Yoon, C.R., Roh, E.S., Cho, J.K., Hattori, T.
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
Get full text
Conference Proceeding