SiGe nMOSFETs with gate oxide grown by low temperature plasma anodisation
Riley, L.S., Hall, S., Harris, J., Fernandez, J., Gallas, B., Evans, A.G.R., Clarke, J.F., Humphrey, J., Murray, R.T., Jeynes, C.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Journal Article
Conference Proceeding
Noise in p-channel SiGe and Si MOSFETs with gate oxide grown by low temperature plasma anodisation
Lukyanchikova, N.B., Petrichuk, M.V., Garbar, N.P., Riley, L.S., Hall, S.
Published in 2001 International Symposium on Electron Devices for Microwave and Optoelectronic Applications. EDMO 2001 (Cat. No.01TH8567) (2001)
Published in 2001 International Symposium on Electron Devices for Microwave and Optoelectronic Applications. EDMO 2001 (Cat. No.01TH8567) (2001)
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Conference Proceeding
Noise investigation of SiGe and Si nMOSFETs with gate oxide grown by low temperature plasma anodisation
Lukyanchikova, N.B., Petrichuk, M.V., Garbar, N.P., Riley, L.S., Hall, S.
Published in 8th IEEE International Symposium on High Performance Electron Devices for Microwave and Optoelectronic Applications (Cat. No.00TH8534) (2000)
Published in 8th IEEE International Symposium on High Performance Electron Devices for Microwave and Optoelectronic Applications (Cat. No.00TH8534) (2000)
Get full text
Conference Proceeding