High-power, high-repetition-rate pulsed CO2 lasers and their application in EUV lithography sources
Yezheng Tao, Schafgans, Alex, Rokitski, Slava, Kats, Michael, Stewart, Jayson, Grava, Jonathan, Das, Palash, Urbanski, Lukasz, Purvis, Mike, Vargas, Mike, Rich, Spencer, Abraham, Mathew, Conklin, Phil, Rafac, Rob, Sandstrom, Rick, Fomenkov, Igor, Brandt, David, Brown, Daniel
Published in 2016 Conference on Lasers and Electro-Optics (CLEO) (01.06.2016)
Published in 2016 Conference on Lasers and Electro-Optics (CLEO) (01.06.2016)
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Conference Proceeding
EUV LPP source with improved dose control by combining pulse modulation and pulse control mode
Liu Andrew, Chang Steven, Dunstan Wayne J, Frihauf Paul, Graham Matthew R, Rich Spencer, Riggs Daniel Jason
Year of Publication 05.09.2017
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Year of Publication 05.09.2017
Patent