Search Results - "Rhee, S. W" :: K.UTB vyhledávací portál

Improving the functionality of carbon nanodots: doping and surface functionalization

by Park, Y, Yoo, J, Lim, B, Kwon, W, Rhee, S.-W
Published in Journal of materials chemistry. A, Materials for energy and sustainability (01.01.2016)

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SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

by Burton, B. B, Kang, S. W, Rhee, S. W, George, S. M
Published in Journal of physical chemistry. C (14.05.2009)

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Molecular design and synthesis of ruthenium(ii) sensitizers for highly efficient dye-sensitized solar cells

by Anthonysamy, A., Lee, Y., Karunagaran, B., Ganapathy, V., Rhee, S.-W., Karthikeyan, S., Kim, K. S., Ko, M. J., Park, N.-G., Ju, M.-J., Kim, J. K.
Published in Journal of materials chemistry (01.01.2011)

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Comparative study of Cu precursors for 3D focused electron beam induced deposition

by LUISIER, A, UTKE, I, BRET, T, CICOIRA, F, HAUERT, R, RHEE, S.-W, DOPPELT, P, HOFFMANN, P
Published in Journal of the Electrochemical Society (2004)

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Comparative study of Cu-precursors for 3D focused electron beam induced deposition

by LUISIER, A, UTKE, I, BRET, T, CICOIRA, F, HAUERT, R, RHEE, S.-W, DOPPELT, P, HOFFMANN, P
Published in Journal of the Electrochemical Society (2004)

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Atomic Layer Deposition of ZrO2 Thin Films Using Dichlorobis[bis-(trimethylsilyl)amido]zirconium and Water

by Nam, W.-H., Rhee, S.-W.
Published in Chemical vapor deposition (01.09.2004)

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The electrical and interface properties of metal-ferroelectric (lanthanum substituted bismuth titanate: BLT)-insulator-semiconductor (MFIS) structures with various insulators

by KANG, S. W, KIM, W. K, RHEE, S. W
Published in Journal of materials science (01.01.2007)

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Yttrium-substituted bismuth titanate (Bi4-xYxTi3O12) thin film for use in non-volatile memories

by KANG, S. W, RHEE, S. W
Published in Journal of materials science. Materials in electronics (01.04.2004)

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Bulk and interface properties of low-temperature silicon nitride films deposited by remote plasma enhanced chemical vapor deposition

by Park, Young-bae, Rhee, Shi-woo
Published in Journal of materials science. Materials in electronics (01.09.2001)

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Cyclic Atomic Layer Deposition of Hafnium Aluminate Thin Films Using Tetrakis(diethylamido)hafnium, Trimethyl Aluminum, and Water

by Kim, S.-H., Rhee, S.-W.
Published in Chemical vapor deposition (01.03.2006)

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Electrical properties of bulk silicon dioxide and SiO2/Si interface formed by tetraethylorthosilicate-ozone chemical vapor deposition

by KIM, H.-U, RHEE, S.-W
Published in Journal of the Electrochemical Society (01.04.2000)

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Effect of aluminium addition on the combustion reaction of titanium and carbon to form TiC

by Choi, Yoon, Rhee, Shi -Woo
Published in Journal of materials science (01.01.1993)

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Growth of bismuth oxide films by direct liquid injection-metal organic chemical vapor deposition with Bi(tmhd) 3 (tmhd: 2,2,6,6-tetramethyl-3,5-heptanedione)

by Kang, S.W., Rhee, S.W.
Published in Thin solid films (01.12.2004)

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Absorption, distribution, metabolism and excretion of telmesteine, a mucolitic agent, in rat

by LEE, J, SON, J, RHEE, S. W, KIM, D. H
Published in Xenobiotica (01.07.2003)

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Removal of Aquatic Chromate Ion Involving Rehydration Reaction of Calcined Layered Double Hydroxide (Mg-Al-CO3)

by Rhee, S. W., Kang, M. J., Kim, H., Moon, C. H.
Published in Environmental technology (01.02.1997)

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Chemical vapor deposition of barium strontium titanate films with direct liquid injection of single-mixture solution

by LEE, J.-H, RHEE, S.-W
Published in Journal of the Electrochemical Society (01.10.1999)

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Effect of carbon sources on the combustion synthesis of TiC

by Choi, Yoon, Rhee, Shi-Woo
Published in Journal of materials science (15.09.1995)

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The effect of carrier gas and H(hfac) on MOCVD Cu films using (hfac)Cu(1,5-COD) as a precursor

by LEE, W. H, KO, Y. K, CHOI, J. H, BYUN, I. J, KWAK, H. T, KIM, D. H, RHEE, S. W, REUCROFT, P. J, LEE, J. G
Published in Journal of electronic materials (01.08.2001)

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