Template fabrication schemes for step and flash imprint lithography
Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Journal Article
Conference Proceeding
Fabrication of multi-tiered structures on step and flash imprint lithography templates
Johnson, S., Resnick, D.J., Mancini, D., Nordquist, K., Dauksher, W.J., Gehoski, K., Baker, J.H., Dues, L., Hooper, A., Bailey, T.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.06.2003)
Published in Microelectronic engineering (01.06.2003)
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Journal Article
Conference Proceeding
Efficient and robust algorithms for Monte Carlo and e-beam lithography simulation
Ivin, V.V., Silakov, M.V., Vorotnikova, N.V., Resnick, D.J., Nordquist, K.N., Siragusa, L.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications
Ainley, E., Nordquist, K., Resnick, D.J., Carr, D.W., Tiberio, R.C.
Published in Microelectronic engineering (01.05.1999)
Published in Microelectronic engineering (01.05.1999)
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Journal Article
Conference Proceeding
Etch characteristics of giant magnetoresistive materials
Resnick, D.J., Pendharkar, S., Kyler, K., Kerszykowski, G., Clemens, S., Tompkins, H., Durlam, M., Tehrani, S.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Conference Proceeding
Thermal characteristics of an X-ray mask during pattern transfer
Resnick, D.J., Pendharkar, S.V., Dauksher, W.J., Cummings, K.D., Laudon, M.F., Romanowicz, B., Renaud, P., Engelstad, R.L.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Journal Article
Conference Proceeding
Etch characteristics of an amorphous refractory absorber
Resnick, D.J., Pendharkar, S.V., Dauksher, W.J., Cummings, K.D., Johnson, W.A., Constantine, C.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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High-performance AlGaAs/GaAs SDHTs and ring oscillators grown by MBE on Si substrates
Ren, F., Chand, N., Chen, Y.-K., Pearton, S., Tennant, D.M., Resnick, D.J.
Published in IEEE electron device letters (01.12.1989)
Published in IEEE electron device letters (01.12.1989)
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Journal Article
Improved step and flash imprint lithography templates for nanofabrication
Resnick, D.J., Mancini, D., Dauksher, W.J., Nordquist, K., Bailey, T.C., Johnson, S., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.09.2003)
Published in Microelectronic engineering (01.09.2003)
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Journal Article
Modeling and simulation issues in Monte Carlo calculation of electron interaction with solid targets
Ivin, V.V, Silakov, M.V, Babushkin, G.A, Lu, B, Mangat, P.J, Nordquist, K.J, Resnick, D.J
Published in Microelectronic engineering (01.09.2003)
Published in Microelectronic engineering (01.09.2003)
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Journal Article
Step and Flash Imprint Lithography
Bailey, T.C, Johnson, S.C, Sreenivasan, S.V, Ekerdt, J.G, Willson, C.G, Resnick, D.J
Published in Journal of photopolymer science and technology (30.05.2002)
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Published in Journal of photopolymer science and technology (30.05.2002)
Journal Article
The inclusion of secondary electrons and Bremsstrahlung X-rays in an electron beam resist model
Ivin, V.V., Silakov, M.V., Kozlov, D.S., Nordquist, K.J., Lu, B., Resnick, D.J.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Journal Article
Modeling and experimental data using a new high rate ICP tool for dry etching 200 mm EPL masks
Dauksher, W.J., Clemens, S.B., Resnick, D.J., Smith, K.H., Mangat, P.J.S., Rauf, S., Stout, P., Ventzek, P.L.G., Ashraf, H., Lea, L., Hall, S., Hopkins, J., Chambers, A.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Conference Proceeding
Large area electron scattering effects on SCALPEL mask critical dimension control
Nordquist, K., Resnick, D.J., Ivin, V., Mangat, P., Lu, B., Masnyj, Z., Ainley, E., Dauksher, W.J., Mancini, D., Silakov, M., Minyushkin, D., Vorotnikova, N.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks
Dauksher, W.J., Clemens, S.B., Resnick, D.J., Smith, K.H., Mangat, P.J.S., Rauf, S., Ventzek, P.L.G., Arunachalam, V., Ramamurthi, B.N., Ashraf, H., Lea, L., Hall, S., Johnston, I.R., Hopkins, J., Bhardwaj, J.K.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Conference Proceeding
A new operating regime for electroplating the gold absorber on x-ray masks
Dauksher, W.J., Resnick, D.J., Johnson, W.A., Yanof, A.W.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article
FETs on lattice-mismatched substrates: GaAs/InP and GaAs-AlGaAs/Si
Ren, F., Hobson, W.S., Pearton, S.J., Chand, N., Chen, Y.K., Tennant, D.M., Resnick, D.J.
Published in 11th Annual Gallium Arsenide Integrated Circuit (GaAs IC) Symposium (1989)
Published in 11th Annual Gallium Arsenide Integrated Circuit (GaAs IC) Symposium (1989)
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Conference Proceeding