Study and optimize on the process of Floating gate with dry etching
Qingyao, Gao, Zhang, Wenwen, Renrui, Huang, Yongzhi, Fang, Liang, Zhibin, Li, Xiaohong, Zhu, Wenming
Published in Engineering Research Express (01.09.2021)
Published in Engineering Research Express (01.09.2021)
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Journal Article
Study on the Transformation of Si Trench Profile With Low Pressure of SF₆/O₂ Containing Plasmas
Zhang, Wenwen, Huang, Renrui
Published in IEEE transactions on semiconductor manufacturing (01.11.2022)
Published in IEEE transactions on semiconductor manufacturing (01.11.2022)
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Journal Article
The filling seams improvement and properties analyses of tungsten films
Xu, Shaohui, Yao, Pan, Zhang, Jiandong, Huang, Renrui
Published in Microelectronic engineering (01.04.2020)
Published in Microelectronic engineering (01.04.2020)
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Journal Article
Vertical Channel Transistor (VCT) as Access Transistor for Future 4F2 DRAM Architecture
Feng, Daohuan, Jiang, Yi, Qiu, Yunsong, Zheng, Yuhong, Kim, Harry, Kim, Jaewoo, Chu, Jian, Shao, Guangsu, Liao, Yucheng, Yang, Chen, Hu, Minrui, Zhao, Wenli, Xia, Linjiang, Xiao, Jianfeng, Ma, Di, Cheng, Yuan, Kong, Xiangbo, Lin, Chao, Li, Tianming, Li, Yongjie, Meng, Jingheng, Shao, Kai, Wang, Yan, Yang, Xiaoan, Liu, Xiang, Han, Qinghua, Li, Huiming, Tang, Yanzhe, Liu, Mingde, Wu, Eric, Li, Xiaoping, Huang, Renrui, Zhang, Mingtang, Hou, Long, Pan, Xuan, Jin, Xinwen, Zhao, Shuiping, Han, Dh, Park, Ted, Xiao, Deyuan, Zhao, Chao, Yoo, Abraham
Published in 2023 IEEE International Memory Workshop (IMW) (01.05.2023)
Published in 2023 IEEE International Memory Workshop (IMW) (01.05.2023)
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