Process optimization to reduce NiSi pipes and NiSi agglomeration on 28nm Nickel silicide LSA ms anneal process
Vijayaragavan, Varadharajan, Fitz, Clemens, Lepper, Marco, Reisdorf, Ralf, Jan, Holub, Van Le, Willis, Jim, Yun Wang, Awdshiew, Michael
Published in 2015 International Symposium on VLSI Technology, Systems and Applications (01.04.2015)
Published in 2015 International Symposium on VLSI Technology, Systems and Applications (01.04.2015)
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