Conduction mechanisms in thin atomic layer deposited Al2O3 layers
Spahr, Holger, Montzka, Sebastian, Reinker, Johannes, Hirschberg, Felix, Kowalsky, Wolfgang, Johannes, Hans-Hermann
Published in Journal of applied physics (14.11.2013)
Published in Journal of applied physics (14.11.2013)
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Journal Article
Regimes of leakage current in ALD-processed Al2O3 thin-film layers
Spahr, Holger, Reinker, Johannes, Bülow, Tim, Nanova, Diana, Johannes, Hans-Hermann, Kowalsky, Wolfgang
Published in Journal of physics. D, Applied physics (17.04.2013)
Published in Journal of physics. D, Applied physics (17.04.2013)
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Journal Article
Impact of morphological defects on the electrical breakdown of ultra thin atomic layer deposition processed Al2O3 layers
Spahr, Holger, Bülow, Tim, Nowak, Christine, Hirschberg, Felix, Reinker, Johannes, Hamwi, Sami, Johannes, Hans-Hermann, Kowalsky, Wolfgang
Published in Thin solid films (01.05.2013)
Published in Thin solid films (01.05.2013)
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Journal Article
Regimes of leakage current in ALD-processed Al 2 O 3 thin-film layers
Spahr, Holger, Reinker, Johannes, Bülow, Tim, Nanova, Diana, Johannes, Hans-Hermann, Kowalsky, Wolfgang
Published in Journal of physics. D, Applied physics (17.04.2013)
Published in Journal of physics. D, Applied physics (17.04.2013)
Get full text
Journal Article