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"Reder, Steven E"
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"Reder, Steven E"
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Method for heat dissipation on semiconductor device
by
PRATHER ZACHARY A
,
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
18.02.2014
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Method for heat dissipation on semiconductor device
by
PRATHER ZACHARY A
,
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
26.03.2013
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Electroplating tool for semiconductor manufacture having electric field control
by
Reder
,
Steven E
,
Berman, Michael J
Year of Publication
19.02.2008
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Electroplating tool for semiconductor manufacture having electric field control
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
19.02.2008
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Reactor system
by
Reder
,
Steven E
,
Pillow, Preston E
Year of Publication
01.01.2008
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Reactor system
by
PILLOW PRESTON E
,
REDER STEVEN E
Year of Publication
01.01.2008
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Contact resistance device for improved process control
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
27.02.2007
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Contact resistance device for improved process control
by
Berman, Michael J
,
Reder
,
Steven E
Year of Publication
27.02.2007
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Abrasive Electrolyte
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
05.10.2006
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Method to improve the control of electro-polishing by use of a plating electrode in an electrolyte bath
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
24.08.2006
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Method to improve the control of electro-polishing by use of a plating electrode an electrolyte bath
by
Berman, Michael J
,
Reder
,
Steven E
Year of Publication
27.06.2006
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Method to improve the control of electro-polishing by use of a plating electrode an electrolyte bath
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
27.06.2006
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Magnetic focus rings for improved copper plating
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
24.11.2005
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Chemical mechanical electropolishing system
by
Reder
,
Steven E
,
Berman, Michael J
Year of Publication
09.08.2005
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Chemical mechanical electropolishing system
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
09.08.2005
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Contact resistance device for improved process control
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
26.05.2005
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Abrasive electrolyte
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
28.04.2005
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Chemical mechanical electropolishing system
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
28.04.2005
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Electropolishing pad
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
28.04.2005
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Method for achieving wafer contact for electro-processing
by
REDER STEVEN E
,
BERMAN MICHAEL J
Year of Publication
17.02.2005
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