Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films
Möls, Kristel, Aarik, Lauri, Mändar, Hugo, Kasikov, Aarne, Niilisk, Ahti, Rammula, Raul, Aarik, Jaan
Published in Optical materials (01.10.2019)
Published in Optical materials (01.10.2019)
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Journal Article
Atomic layer deposition of TiO2 from TiCl4 and O3
Aarik, Lauri, Arroval, Tõnis, Rammula, Raul, Mändar, Hugo, Sammelselg, Väino, Aarik, Jaan
Published in Thin solid films (01.09.2013)
Published in Thin solid films (01.09.2013)
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Journal Article
Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition
Kalam, Kristjan, Otsus, Markus, Kozlova, Jekaterina, Tarre, Aivar, Kasikov, Aarne, Rammula, Raul, Link, Joosep, Stern, Raivo, Vinuesa, Guillermo, Lendínez, José Miguel, Dueñas, Salvador, Castán, Helena, Tamm, Aile, Kukli, Kaupo
Published in Nanomaterials (Basel, Switzerland) (28.07.2022)
Published in Nanomaterials (Basel, Switzerland) (28.07.2022)
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Journal Article
Atomic layer deposition of epitaxial HfO2 thin films on r-cut sapphire
Mändar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan
Published in Journal of materials research (14.07.2013)
Published in Journal of materials research (14.07.2013)
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Journal Article
Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone
Kalam, Kristjan, Rammula, Raul, Ritslaid, Peeter, Käämbre, Tanel, Link, Joosep, Stern, Raivo, Vinuesa, Guillermo, Dueñas, Salvador, Castán, Helena, Tamm, Aile, Kukli, Kaupo
Published in Nanotechnology (13.08.2021)
Published in Nanotechnology (13.08.2021)
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Journal Article
Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure
Möldre, Kristel, Aarik, Lauri, Mändar, Hugo, Niilisk, Ahti, Rammula, Raul, Tarre, Aivar, Aarik, Jaan
Published in Journal of crystal growth (15.10.2015)
Published in Journal of crystal growth (15.10.2015)
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Journal Article
Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors
Aarik, Lauri, Arroval, Tõnis, Rammula, Raul, Mändar, Hugo, Sammelselg, Väino, Hudec, Boris, Hušeková, Kristína, Fröhlich, Karol, Aarik, Jaan
Published in Thin solid films (28.08.2014)
Published in Thin solid films (28.08.2014)
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Journal Article
Atomic layer deposition of rutile and TiO sub(2)-II from TiCl sub(4) and O sub(3) on sapphire: Influence of substrate orientation on thin film structure
Moldre, Kristel, Aarik, Lauri, Mandar, Hugo, Niilisk, Ahti, Rammula, Raul, Tarre, Aivar, Aarik, Jaan
Published in Journal of crystal growth (15.10.2015)
Published in Journal of crystal growth (15.10.2015)
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Journal Article
Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor
Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mi ušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, Karol
Published in Journal of physics. D, Applied physics (25.09.2013)
Published in Journal of physics. D, Applied physics (25.09.2013)
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Journal Article
Atomic layer deposition of epitaxial HfO sub(2) thin films on r-cut sapphire
Maendar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan
Published in Journal of materials research (14.07.2013)
Published in Journal of materials research (14.07.2013)
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Journal Article
Atomic layer deposition of epitaxial HfO 2 thin films on r -cut sapphire
Mändar, Hugo, Rammula, Raul, Aidla, Aleks, Aarik, Jaan
Published in Journal of materials research (14.07.2013)
Published in Journal of materials research (14.07.2013)
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Journal Article
Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O
Aarik, Lauri, Alles, Harry, Aidla, Aleks, Kahro, Tauno, Kukli, Kaupo, Niinistö, Jaakko, Mändar, Hugo, Tamm, Aile, Rammula, Raul, Sammelselg, Väino, Aarik, Jaan
Published in Thin solid films (28.08.2014)
Published in Thin solid films (28.08.2014)
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Journal Article
Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current
Aarik, Jaan, Arroval, Tõnis, Aarik, Lauri, Rammula, Raul, Kasikov, Aarne, Mändar, Hugo, Hudec, Boris, Hušeková, Kristina, Fröhlich, Karol
Published in Journal of crystal growth (01.11.2013)
Published in Journal of crystal growth (01.11.2013)
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Journal Article