Extreme Contact Scaling with Advanced Metallization of Cobalt
Hung, Raymond, Park, Jin Hee, Ha, Tae Hong, Lee, Mark, Hou, Wenting, Lei, Jianxin, Bakke, Jonathan R., Sharma, Shashank, Sharma, Karthik Raman, Kim, Nam Sung, Yeh, Ellie, Wachs, Amir
Published in 2018 IEEE International Interconnect Technology Conference (IITC) (01.06.2018)
Published in 2018 IEEE International Interconnect Technology Conference (IITC) (01.06.2018)
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Conference Proceeding
Advanced Millisecond Annealing Approaches for High-k Metal Gate and Contact Scaling
Sharma, Shashank, Chen, Jaujiun, Ng, Ben, McIntosh, Robert C, Muthukrishnan, Shankar, Raman Sharma, Karthik, Graoui, Houda, Mayur, Abhilash
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
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Journal Article
Nickel Silicide Anneals Modification Enables Scaling
Zelenko, Jeremy, Muthukrishnan, Shankar, Karthik Raman Sharma
Published in Semiconductor International (01.03.2010)
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Published in Semiconductor International (01.03.2010)
Magazine Article
Trade Publication Article