Statistics of electromigration early failures in Cu/oxide dual-damascene interconnects
Ogawa, E.T., Lee, K.-D., Matsuhashi, H., Ko, K.-S., Justison, P.R., Ramamurthi, A.N., Bierwag, A.J., Ho, P.S., Blaschke, V.A., Havemann, R.H.
Published in 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167) (2001)
Published in 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167) (2001)
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