Thermal decomposition mechanism of Ti(O-iPr)2(DPM)2
RYU, H.-K, JUNG SHIK HEO, CHO, S.-I, SANG HEUP MOON
Published in Journal of the Electrochemical Society (01.03.1999)
Published in Journal of the Electrochemical Society (01.03.1999)
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Journal Article
Etch Characteristics of Silsesquioxane-based Low Dielectric Constant Material in Fluorocarbon Plasma
Hwang, Sung-Wook, Lee, Gyeo-Re, Min, Jae-Ho, Moon, Sang Heup, Kim, Yu Chang, Ryu, Hyun-Kyu, Cho, Yun Seok, Kim, Jin Woong
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
Thermal decomposition mechanism of Ba(DPM)2
Ryu, Hyun-Kyu, Cho, Sung-Il, Heo, Jung Shik, Cho, Yong Suk, Moon, Sang Heup
Published in Research on chemical intermediates (01.01.2000)
Published in Research on chemical intermediates (01.01.2000)
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Journal Article
Effect of Dielectric Process on the Interfacial Adhesion of RDL for FOWLP
Son, Kirak, Kim, Gahui, Park, Young-Bae, Ryu, Hyun-Kyu
Published in 2020 IEEE 70th Electronic Components and Technology Conference (ECTC) (01.06.2020)
Published in 2020 IEEE 70th Electronic Components and Technology Conference (ECTC) (01.06.2020)
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Conference Proceeding
POLYIMIDE RESIN HAVING VINYL GROUP AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING SAME
LEE, JAE WOO, OH, SEUNG KEUN, RYU, HYUN KYU, KIM, JAE HYUN, HAN, DONG WOO
Year of Publication 19.10.2016
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Year of Publication 19.10.2016
Patent
Thermal Decomposition Mechanism of Sr(DPM)[sub 2]
Ryu, Hyun-Kyu, Heo, Jung Shik, Cho, Sung-Il, Chung, Chanhwa, Moon, Sang Heup
Published in Journal of the Electrochemical Society (2000)
Published in Journal of the Electrochemical Society (2000)
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Journal Article
COMPOSITION FOR REMOVING AN ADHESIVE AND METHOD FOR PORDUCING THIN WAFER USING THE SAME
KIM, HYUN TAK, JEONG, RAE HYUNG, LEE, MIN KYU, HAN, JUNG HYUN, SHIM, JAE WON, RYU, HYUN KYU, LEE, JIN KYU
Year of Publication 26.10.2016
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Year of Publication 26.10.2016
Patent
Degradation of Ba(DPM)2 during storage in a desiccator for extended periods
Ryu, Hyun-Kyu, Heo, Jung Shik, Cho, Sung-Il, Cho, Yong Suk, Moon, Sang Heup
Published in The Korean journal of chemical engineering (01.11.1999)
Published in The Korean journal of chemical engineering (01.11.1999)
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Journal Article
A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas
Ryu, Hyun-Kyu, Kim, Yil-Wook, Lee, Kangtaek, Shin, CheeBurm, Kim, Chang-Koo
Published in Microelectronics (01.01.2007)
Published in Microelectronics (01.01.2007)
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Journal Article