Curvilinear Standard Cell Design for Semiconductor Manufacturing
Kim, Ryoung-Han, Hwang, Soobin, Oak, Apoorva, Shirazi, Yasser, Chang, Hsinlan, Yang, Kiho, Mirabelli, Gioele
Published in IEEE transactions on semiconductor manufacturing (01.05.2024)
Published in IEEE transactions on semiconductor manufacturing (01.05.2024)
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Journal Article
Patterning Aware Design Optimization of Selective Etching in N5 and Beyond
Yibo Lin, Debacker, Peter, Trivkovic, Darko, Ryoung-Han Kim, Raghavan, Praveen, Pan, David Z.
Published in 2017 IEEE International Conference on Computer Design (ICCD) (01.11.2017)
Published in 2017 IEEE International Conference on Computer Design (ICCD) (01.11.2017)
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Conference Proceeding
Thin absorber extreme ultraviolet photomask based on Ni-TaN nanocomposite material
Hay, Darrick, Bagge, Patrick, Khaw, Ian, Sun, Lei, Wood, Obert, Chen, Yulu, Kim, Ryoung-Han, Qi, Zhengqing John, Shi, Zhimin
Published in Optics letters (15.08.2016)
Published in Optics letters (15.08.2016)
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Journal Article
Fourier spectrum method to determine dose-to-clear in a photoresist
Sun, Lei, Wood, Obert, Clifford, Chris, Raghunathan, Sudhar, Kritsun, Oleg, Lee, Myungjun, Kim, Ryoung-Han, Mangat, Pawitter, Koh, Hui Peng, Levinson, Harry
Published in Optics letters (15.01.2014)
Published in Optics letters (15.01.2014)
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Journal Article
Narrowband Bragg reflectors in Ti:LiNbO3 optical waveguides
Kim, Ryoung-Han, Zhang, Jun, Eknoyan, Ohannes, Taylor, Henry F, Smith, Terry L
Published in Applied optics (2004) (10.07.2006)
Published in Applied optics (2004) (10.07.2006)
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Journal Article