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"RUAN JUNRU"
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"RUAN JUNRU"
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Determining a correction to a process
by
HULSEBOS EDO MARIA
,
WERKMAN ROY
,
ROY SARATHI
,
RUAN JUNRU
Year of Publication
12.09.2023
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Patent
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공정에 대한 보정 결정
by
HULSEBOS EDO MARIA
,
WERKMAN ROY
,
ROY SARATHI
,
RUAN JUNRU
Year of Publication
10.06.2021
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Patent
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PATTERNING PARAMETER DETERMINATION USING A CHARGED PARTICLE INSPECTION SYSTEM
by
RUAN
,
Junru
,
LI, Haiyan
Year of Publication
27.06.2024
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Patent
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Electron Beam Lithography throughput and resolution enhancement with innovative blanker design
by
Ruan
,
Junru
Year of Publication
01.01.2010
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Dissertation
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PATTERNING PARAMETER DETERMINATION USING A CHARGED PARTICLE INSPECTION SYSTEM
by
RUAN
,
Junru
,
LI, Haiyan
Year of Publication
16.03.2023
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Patent
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Determining a correction to a process
by
Werkman, Roy
,
Ruan
,
Junru
,
Hulsebos, Edo Maria
,
Roy, Sarathi
Year of Publication
28.05.2024
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METHOD FOR CONFIGURING A SEMICONDUCTOR MANUFACTURING PROCESS, A LITHOGRAPHIC APPARATUS AND AN ASSOCIATED COMPUTER PROGRAM PRODUCT
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo Maria
,
ROY, Sarathi
Year of Publication
11.05.2022
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DETERMINING A CORRECTION TO A PROCESS
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo, Maria
,
ROY, Sarathi
Year of Publication
30.03.2022
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Patent
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SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM OPTICAL METROLOGY DATA USING MACHINE LEARNING
by
RUAN
,
Junru
,
KEECH, Nathan
,
CHIN, Huai-Ying
,
ALEXANDER, Spencer
,
LI, Haiyan
Year of Publication
17.08.2023
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DETERMINING A CORRECTION TO A PROCESS
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo Maria
,
ROY, Sarathi
Year of Publication
28.10.2021
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Patent
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Determining a correction to a process
by
Werkman, Roy
,
Ruan
,
Junru
,
Hulsebos, Edo Maria
,
Roy, Sarathi
Year of Publication
10.08.2021
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Patent
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DETERMINING A CORRECTION TO A PROCESS
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo Maria
,
ROY, Sarathi
Year of Publication
03.06.2021
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Patent
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Patterning parameter determination using a charged particle inspection system
by
LI, HAIYAN
,
RUAN
,
JUNRU
Year of Publication
11.06.2024
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Patent
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Patterning parameter determination using charged particle inspection system
by
LI HAIYAN
,
RUAN JUNRU
Year of Publication
14.05.2024
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Patent
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DETERMINING A CORRECTION TO A PROCESS
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo Maria
,
ROY, Sarathi
Year of Publication
21.04.2021
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Automated determination of height and tilt of a substrate surface within a lithography system
by
RUAN JUNRU
Year of Publication
07.02.2012
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Patent
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Automated determination of height and tilt of a substrate surface within a lithography system
by
Ruan
,
Junru
Year of Publication
07.02.2012
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Patent
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DETERMINING A CORRECTION TO A PROCESS
by
WERKMAN, Roy
,
RUAN
,
Junru
,
HULSEBOS, Edo
,
ROY, Sarathi
Year of Publication
14.05.2020
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Patent
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AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE WITHIN A LITHOGRAPHY SYSTEM
by
RUAN
,
JUNRU
Year of Publication
25.02.2010
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Patent
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AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE WITHIN A LITHOGRAPHY SYSTEM
by
RUAN
,
JUNRU
Year of Publication
23.12.2009
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Patent
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