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"ROY, SUDIPTO RANENDRA"
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"ROY, SUDIPTO RANENDRA"
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Lineares chemisch-mechanisches Polierwerkzeug mit an Ort und Stelle Verteilung der Polierzusammensetzung und gleichzeitigem konditionieren des Polierkissens
by
SUDIPTO RANENDRA
,
ROY
Year of Publication
15.11.2007
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LINEARES CHEMISCH-MECHANISCHES POLIERWERKZEUG MIT AN ORT UND STELLE VERTEILUNG DER POLIERZUSAMMENSETZUNG UND GLEICHZEITIGEM KONDITIONIEREN DES POLIERKISSENS
by
SUDIPTO RANENDRA
,
ROY
Year of Publication
15.01.2007
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A linear CMP tool design using in-situ slurry distribution and concurrent pad conditionning
by
SUDIPTO RANENDRA
,
ROY
Year of Publication
03.01.2007
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Embedded metal scheme for liquid crystal display (LCD) application
by
Roy
,
Sudipto Ranendra
Year of Publication
30.12.2003
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Embedded metal scheme for liquid crystal display (LCD) application
by
ROY SUDIPTO RANENDRA
Year of Publication
30.12.2003
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A linear CMP tool design using in-situ slurry distribution and concurrent pad conditionning
by
SUDIPTO RANENDRA
,
ROY
Year of Publication
02.07.2003
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Linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning
by
ROY SUDIPTO RANENDRA
Year of Publication
15.04.2003
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Linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning
by
Roy
,
Sudipto Ranendra
Year of Publication
15.04.2003
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Linear CMP tool design with closed loop slurry distribution
by
Roy
,
Sudipto Ranendra
Year of Publication
18.02.2003
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Linear CMP tool design with closed loop slurry distribution
by
ROY SUDIPTO RANENDRA
Year of Publication
18.02.2003
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A novel linear CMP tool design with closed loop slurry distribution
by
ROY
,
SUDIPTO RANENDRA
Year of Publication
11.11.2002
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A NOVEL LINEAR CMP TOOL DESIGN USING IN-SITU SLURRY DISTRIBUTION AND CONCURRENT PAD CONDITIONING
by
SUDIPTO RANENDRA ROY
Year of Publication
15.10.2002
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A NOVEL EMBEDDED METAL SCHEME FOR LIQUID CRYSTAL DISPLAY (LCD) APPLICATION
by
SUDIPTO RANENDRA ROY
Year of Publication
20.11.2001
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SACRIFICIAL STOP LAYER AND ENDPOINT FOR METAL CMP
by
SUDIPTO RANENDRA ROY
Year of Publication
21.08.2001
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A novel linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning
by
ROY
,
SUDIPTO RANENDRA
Year of Publication
11.08.2001
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Linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning
by
ROY SUDIPTO RANENDRA
Year of Publication
22.05.2001
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A NOVEL LINEAR CMP TOOL DESIGN WITH CLOSED LOOP SLURRY DISTRIBUTION
by
SUDIPTO RANENDRA ROY
Year of Publication
22.05.2001
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Novel copper interconnect patterning
by
SUDIPTO RANENDRA ROY
Year of Publication
20.02.2001
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Linear CMP tool design with closed loop slurry distribution
by
ROY
;
SUDIPTO RANENDRA
Year of Publication
05.12.2000
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Sacrificial stop layer and endpoint for metal CMP
by
ROY
;
SUDIPTO RANENDRA
Year of Publication
21.11.2000
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