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Year of Publication 20.02.2024
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Year of Publication 20.02.2024
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Year of Publication 20.02.2024
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Year of Publication 20.02.2024
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CMP RETAINING RING FOR CMP
OH JEONGHOON, LEE CHRISTOPHER HEUNG GYUN, LI THOMAS, RONDUM ERIK S, IYER ANAND N, DIAO JIE, NAGENGAST ANDREW J, LEE WEI CHENG, ZHANG HUANBO
Year of Publication 19.07.2022
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Year of Publication 19.07.2022
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Year of Publication 06.03.2019
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Year of Publication 06.03.2019
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SYSTEMS AND METHODS FOR SUBSTRATE POLISHING DETECTION USING IMPROVED FRICTION MEASUREMENT
RONDUM ERIK S, CHEN HUNG CHIH, BUTTERFIELD PAUL D, KARUPPIAH LAKSHMANAN, CHANG SHOU SUNG
Year of Publication 25.07.2014
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Year of Publication 25.07.2014
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COUPLING OF ACOUSTIC SENSOR FOR CHEMICAL MECHANICAL POLISHING
Cherian, Benjamin, Osterheld, Thomas H, Gurusamy, Jay, Rondum, Erik S, Chang, Shou-Sung, Pourmand, Sohrab, Wiswell, Nicholas A
Year of Publication 12.01.2023
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Year of Publication 12.01.2023
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COUPLING OF ACOUSTIC SENSOR FOR CHEMICAL MECHANICAL POLISHING
RONDUM, Erik S, GURUSAMY, Jay, CHANG, Shou-Sung, WISWELL, Nicholas A, CHERIAN, Benjamin, POURMAND, Sohrab, OSTERHELD, Thomas
Year of Publication 12.01.2023
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Year of Publication 12.01.2023
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Retaining ring for CMP
Oh, Jeonghoon, Lee, Christopher Heung-Gyun, Diao, Jie, Li, Thomas, Rondum, Erik S, Zhang, Huanbo, Lee, Wei-Cheng, Nagengast, Andrew J, Iyer, Anand N
Year of Publication 13.06.2023
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Year of Publication 13.06.2023
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System and process for in situ byproduct removal and platen cooling during CMP
Lee, Christopher Heung-Gyun, Diao, Jie, Kim, Bum Jick, Rondum, Erik S, Li, Thomas Ho Fai
Year of Publication 16.07.2019
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Year of Publication 16.07.2019
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A chemical mechanical polishing apparatus
POURMAND, SOHRAB, CHERIAN, BENJAMIN, GURUSAMY, JAY, RONDUM, ERIK S, WISWELL, NICHOLAS A, OSTERHELD, THOMAS H, CHANG, SHOU-SUNG
Year of Publication 01.07.2024
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Year of Publication 01.07.2024
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Coupling of acoustic sensors for chemical mechanical polishing
BULLMAND STEFAN, RONDUM ERIK S, CHERIAN BENJAMIN, WISWELL NICHOLAS ALEXANDER, GURUSAMY JAY, OSTERHELD THOMAS H, ZHANG SHOUSONG
Year of Publication 27.02.2024
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Year of Publication 27.02.2024
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A chemical mechanical polishing apparatus
POURMAND, SOHRAB, CHERIAN, BENJAMIN, GURUSAMY, JAY, RONDUM, ERIK S, WISWELL, NICHOLAS A, OSTERHELD, THOMAS H, CHANG, SHOU-SUNG
Year of Publication 21.02.2024
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Year of Publication 21.02.2024
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Systems and methods for substrate polishing end point detection using improved friction measurement
Chang Shou-Sung, Karuppiah Lakshmanan, Butterfield Paul D, Rondum Erik S, Chen Hung
Year of Publication 09.01.2018
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Year of Publication 09.01.2018
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Retaining ring for CMP
DIAO, JIE, ZHANG, HUANBO, NAGENGAST, ANDREW J, RONDUM, ERIK S, LI, THOMAS, OH, JEONGHOON, LEE, WEING, IYER, ANAND N, LEE, CHRISTOPHER HEUNG-GYUN
Year of Publication 16.04.2024
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Year of Publication 16.04.2024
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Retaining ring for CMP
Oh, Jeonghoon, Lee, Christopher Heung-Gyun, Diao, Jie, Li, Thomas, Rondum, Erik S, Zhang, Huanbo, Lee, Wei-Cheng, Nagengast, Andrew J, Iyer, Anand N
Year of Publication 18.06.2019
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Year of Publication 18.06.2019
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