Search Results - "ROBERT J FALSTER" :: K.UTB vyhledávací portál

PRODUCTION OF HIGH PRECIPITATE DENSITY WAFERS BY ACTIVATION OF INACTIVE OXYGEN PRECIPITATE NUCLEI

by FALSTER ROBERT J, GAMBARO DANIELA, VORONKOV VLADIMIR V, OLMO MASSIMILIANO, CORNARA MARCO
Year of Publication 22.05.2014

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Processes and apparatus for preparing heterostructures with reduced strain by radial compression

by FALSTER, ROBERT J, PITNEY, JOHN A, ALBRECHT, PETER D, VORONKOV, VLADIMIR V
Year of Publication 01.10.2019

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Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield

by FALSTER, ROBERT J, PARK, SOON-SUNG, KIM, TAE-HOON, JI, JUN-HWAN, HUDSON, CARISSIMA MARIE, LEE, YOUNG-JUNG, KIM, BYUNGUN, RYU, JAE-WOO
Year of Publication 01.08.2021

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Non-oxygen precipitating Czochralski silicon wafers

by FALSTER ROBERT J
Year of Publication 19.12.2002

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PROCESS FOR GROWTH OF DEFECT FREE SILICON CRYSTALS OF ARBITRARILY LARGE DIAMETERS

by FALSTER, ROBERT, J
Year of Publication 10.10.2002

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VERFAHREN ZUR HERSTELLUNG VON SILIZIUM MIT NIEDRIGER DEFEKTDICHTE MIT HOHER WACHSTUMRATE

by FALSTER, ROBERT J, VORONKOV, VLADIMIR
Year of Publication 09.03.2006

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Silicon on insulator structure having a low defect density device layer and a process for the preparation thereof

by FALSTER ROBERT J
Year of Publication 22.08.2002

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Process for the preparation of non-oxygen precipitating Czochralski silicon wafers

by Falster, Robert J
Year of Publication 13.08.2002

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Process for the preparation of non-oxygen precipitating Czochralski silicon wafers

by FALSTER ROBERT J
Year of Publication 13.08.2002

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Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering

by FALSTER ROBERT J, BORIONETTI GABRIELLA, VORONKOV VLADIMIR
Year of Publication 03.02.2009

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Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering

by Falster, Robert J, Voronkov, Vladimir, Borionetti, Gabriella
Year of Publication 03.02.2009

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Process for reclaiming semiconductor wafers and reclaimed wafers

by FALSTER ROBERT J
Year of Publication 04.07.2002

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Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield

by FALSTER, ROBERT J, LEE, YOUNG JUNG, HUDSON, CARISSIMA MARIE, KIM, TAE HOON, KIM, BYUNG CHUN, JI, JUN HWAN, RYU, JAE-WOO, PARK, SOON SUNG
Year of Publication 11.04.2021

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