WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS
GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G
Year of Publication 09.10.2024
Get full text
Year of Publication 09.10.2024
Patent
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS
GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G
Year of Publication 08.06.2023
Get full text
Year of Publication 08.06.2023
Patent
System, method and apparatus for RF power compensation in plasma etch chamber
Ramachandran Seetharaman, Chou Shang-I, O'Neill Robert G, Tonnis Eric, Sato Arthur
Year of Publication 09.08.2016
Get full text
Year of Publication 09.08.2016
Patent
COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGS
TAE WON KIM, HONG SHIH, TOM STEVENSON, RAPHAEL CASAES, YAN FANG, ROBERT G. O'NEILL
Year of Publication 29.06.2015
Get full text
Year of Publication 29.06.2015
Patent
System, Method and Apparatus for RF Power Compensation in Plasma Etch Chamber
RAMACHANDRAN SEETHARAMAN, CHOU SHANG-I, SATO ARTHUR, TONNIS ERIC, O'NEILL ROBERT G
Year of Publication 27.11.2014
Get full text
Year of Publication 27.11.2014
Patent
Corrosion resistant aluminum coating on plasma chamber components
RAMANATHAN SIVAKAMI, OUTKA DUANE, CASTILLO SONIA, KERNS JOHN MICHAEL, XU LIN, AMADIO ANTHONY, HOLLAND PETER, SHIH HONG, O'NEILL ROBERT G, DAUGHERTY JOHN, KIM TAE WON
Year of Publication 10.05.2016
Get full text
Year of Publication 10.05.2016
Patent
COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGS
TAE WON KIM, HONG SHIH, TOM STEVENSON, RAPHAEL CASAES, YAN FANG, ROBERT G. O'NEILL
Year of Publication 31.05.2013
Get full text
Year of Publication 31.05.2013
Patent
COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGS
FANG YAN, STEVENSON TOM, CASAES RAPHAEL, SHIH HONG, O'NEILL ROBERT G, KIM TAE WON
Year of Publication 25.04.2013
Get full text
Year of Publication 25.04.2013
Patent
System, method and apparatus for rf power compensation in plasma etch chamber
RAMACHANDRAN, SEETHARAMAN, TONNIS, ERIC, O'NEILL, ROBERT G, CHOU, SHANG I, SATO, ARTHUR
Year of Publication 21.10.2018
Get full text
Year of Publication 21.10.2018
Patent
CORROSION RESISTANT ALUMINUM COATING ON PLASMA CHAMBER COMPONENTS
RAMANATHAN SIVAKAMI, OUTKA DUANE, CASTILLO SONIA, KERNS JOHN MICHAEL, XU LIN, AMADIO ANTHONY, HOLLAND PETER, SHIH HONG, O'NEILL ROBERT G, DAUGHERTY JOHN, KIM TAE WON
Year of Publication 18.09.2014
Get full text
Year of Publication 18.09.2014
Patent