Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO 4 Gate Dielectrics for 32nm CMOS High Performance Logic SOI Technologies
Kelwing, Torben, Mutas, Sergej, Trentzsch, Martin, Naumann, Andreas, Trui, Bernhard, Herrmann, Lutz, Graetsch, Falk, Klein, Christoph, Wilde, Lutz, Ohsiek, Susanne, Weisheit, Martin, Peeva, Anita, Richter, Inka, Prinz, Hartmut, Wuerfel, Alexander, Carter, Rick, Stephan, Rolf, Kücher, Peter, Hansch, Walter
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Journal Article
Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO 4 Gate Dielectrics for 32nm High Performance Logic CMOS SOI Technologies
Kelwing, Torben, Naumann, Andreas, Trentzsch, Martin, Mutas, Sergej, Trui, Bernhard, Herrmann, Lutz, Graetsch, Falk, Klein, Christoph, Wilde, Lutz, Ohsiek, Susanne, Weisheit, Martin, Peeva, Anita, Richter, Inka, Prinz, Hartmut, Wuerfel, Alexander, Carter, Rick, Stephan, Rolf, Kücher, Peter, Hansch, Walter
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article
Impact of dual beam laser spike annealing parameters on nickel silicide formation characteristics
Mileham, J, Van Le, Shetty, S, Hebb, J, Yun Wang, Owen, D, Binder, R, Giedigkeit, R, Waidmann, S, Richter, I, Dittmar, K, Prinz, H, Weisheit, M
Published in 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) (01.09.2010)
Published in 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) (01.09.2010)
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Conference Proceeding
Characterization of nickel silicide transition behavior using non-contact CGS metrology
Owen, D M, Hebb, J, Shetty, S, Yun Wang, Van Le, Binder, R, Giedigkeit, R, Waidmann, S, Richter, I, Dittmar, K, Prinz, H, Weisheit, M
Published in 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) (01.09.2010)
Published in 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) (01.09.2010)
Get full text
Conference Proceeding