Plasma etching equipment and method of etching a wafer
RHA, KWAN-GOO, HAN, YOUNG-KI, LEE, JUNG-HEE, JANG, CHUL-HEE, LEE, GIL-HUN
Year of Publication 01.05.2009
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Year of Publication 01.05.2009
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Apparatus for supporting substrate and plasma etching apparatus having the same
RHA, KWAN-GOO, KIM, DONG-WAN, LEE, JUNG-HEE, JANG, CHUL-HEE, LEE, HYANG-JOO, LEE, WON-HAENG
Year of Publication 16.03.2009
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Year of Publication 16.03.2009
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Apparatus and method of processing substrates
JEON, SEON-KYU, RHA, KWAN-GOO, LEE, HEE-SE, LEE, JUNG-HEE, CHUNG, SENG-HYUN, KIM, GEUN-HO
Year of Publication 16.11.2008
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Year of Publication 16.11.2008
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Apparatus for forming a layer
LEE, KWANG-HEE, RHA, KWAN-GOO, LEE, HEE-SE, YUN, SOO-WON, PARK, SEUNG-IL, KIM, GEUN-HO
Year of Publication 16.09.2008
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Year of Publication 16.09.2008
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Apparatus for plasma processing and method for plasma processing
RHA, KWAN-GOO, LEE, JUNG HEE, JEON, SUN Q, HAN, YOUNG KI, LEE, KYUNG-HO, LEE, HEE SE, CHUNG, SEUNG-HYUN, GUAHK, JAE-HO, CHOI, JAEUL, LIM, YONG HWAN
Year of Publication 16.02.2009
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Year of Publication 16.02.2009
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