POLYALLILOXYCARBONYLPENTENAMERS AS LIGHT-SENSITIVE SUBSTRATE OF PHOTORESISTOR
NEFEDOV OLEG M,SU, GASANOVA SABIRA S,SU, RAMAZANOV GAFAR A,SU, GULIEV ABASKULU M,SU, ALYEV ABDUL T,SU
Year of Publication 15.02.1984
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Year of Publication 15.02.1984
Patent
POLYVINYL-ALKENYLCYCLOPROPYL CARBOXYLATES AS PHOTOSENSITIVE BASE FOR PHOTO- AND ELECTRONIC RESISTORS
MUSINA ELMIRA A,SU, GASANOVA SABIRA S,SU, RAMAZANOV GAFAR A,SU, MOZZHUKHIN DMITRIJ D,SU, SELIVANOV GENNADIJ K,SU, AGAEV URFAT KH,SU, GULIEV ABASKULU M,SU, DENISKIN VIKTOR V,SU, ALYEV ABDUL T,SU
Year of Publication 07.12.1983
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Year of Publication 07.12.1983
Patent