Search Results - "RALEY ANGELIQUE D" :: K.UTB vyhledávací portál

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로우 K 유전체 에칭에서 반응성 이온 에칭 지연을 감소시키기 위한 방법

by METZ ANDREW W, RALEY ANGELIQUE D, COLE CHRISTOPHER
Year of Publication 22.01.2020

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패턴 전사 및 리소그래피 결함을 감소시키기 위한 방법

by LIU ERIC CHIH FANG, MOHANTY NIHAR, RALEY ANGELIQUE D
Year of Publication 02.10.2019

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METHOD FOR PATTERNING DIFFERING CRITICAL DIMENSIONS AT SUB-RESOLUTION SCALES

by KO AKITERU, RALEY ANGELIQUE D
Year of Publication 17.03.2016

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METHOD AND SYSTEM FOR SELECTIVE SPACER ETCH FOR MULTI-PATTERNING SCHEMES

by MOHANTY NIHAR, RALEY ANGELIQUE D, MOSDEN AELAN, KAL SUBHADEEP
Year of Publication 13.03.2017

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METHOD FOR INCREASING PATTERN DENSITY IN SELF-ALIGNED PATTERNING SCHEMES WITHOUT USING HARD MASKS

by KO AKITERU, MOHANTY NIHAR, RALEY ANGELIQUE D
Year of Publication 18.10.2016

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기상 식각 시스템 및 방법

by LEFEVRE SCOTT W, MOHANTY NIHAR, RALEY ANGELIQUE D, MOSDEN AELAN, KAL SUBHADEEP
Year of Publication 07.02.2018

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다른 필름 또는 마스크에 대한 실리콘-함유 반사 방지 코팅 또는 실리콘 산질화물의 제어 가능한 식각 선택비에 따른 기상 식각

by LEFEVRE SCOTT W, MOHANTY NIHAR, RALEY ANGELIQUE D, MOSDEN AELAN, KAL SUBHADEEP
Year of Publication 07.02.2018

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MITIGATION OF ASYMMETRICAL PROFILE IN SELF ALIGNED PATTERNING ETCH

by ITO KIYOHITO, KO AKITERU, RALEY ANGELIQUE D
Year of Publication 12.02.2016

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MATERIAL PROCESSING TO ACHIEVE SUB-10NM PATTERNING

by ITO KIYOHITO, KO AKITERU, O'MEARA DAVID L, RALEY ANGELIQUE D
Year of Publication 30.08.2016

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Method for inverse via patterning for back end of line dual damascene structures

by Lutker-Lee, Katie, Raley, Angelique D
Year of Publication 14.06.2022

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Method for reducing lithography defects and pattern transfer

by Mohanty, Nihar, Liu, Eric Chih-Fang, Raley, Angelique D
Year of Publication 17.05.2022

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Method For Increasing Trench CD in EUV Patterning Without Increasing Single Line Opens or Roughness

by Shearer, Jeffrey, Raley, Angelique D
Year of Publication 08.11.2018

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Method for Inverse Via Patterning for Back End of Line Dual Damascene Structures

by Lutker-Lee, Katie, Raley, Angelique D
Year of Publication 18.06.2020

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Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks

by Mohanty, Nihar, Mosden, Aelan, Lefevre, Scott W, Kal, Subhadeep, Raley, Angelique D
Year of Publication 27.12.2022

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Method for reducing reactive ion etch lag in low K dielectric etching

by Metz, Andrew W, Cole, Christopher, Raley, Angelique D
Year of Publication 01.12.2020

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Gas phase etching system and method

by Mohanty, Nihar, Mosden, Aelan, Lefevre, Scott W, Kal, Subhadeep, Raley, Angelique D
Year of Publication 05.07.2022

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Self-Aligned Triple Patterning Process Utilizing Organic Spacers

by Farrell, Richard, Thibaut, Sophie, Raley, Angelique D
Year of Publication 08.11.2018

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GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF Si-CONTAINING ARC OR SILICON OXYNITRIDE TO DIFFERENT FILMS OR MASKS

by Mohanty, Nihar, KAL, Subhadeep, Mosden, Aelan, Lefevre, Scott W, Raley, Angelique D
Year of Publication 15.07.2021

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Method for increasing pattern density in self-aligned patterning schemes without using hard masks

by Ko Akiteru, Raley Angelique D, Mohanty Nihar
Year of Publication 10.10.2017

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Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks

by Mohanty, Nihar, Mosden, Aelan, Lefevre, Scott W, Kal, Subhadeep, Raley, Angelique D
Year of Publication 06.04.2021

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