Hybrid clean for applied materials 200mm centura reduced pressure EPI application
Ackermann, Thomas, Binder, Boris, Schmidt, Jenny, Radecker, Joerg, Caballero, Carlos
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
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Conference Proceeding
METHOD FOR FABRICATING A SELF-ALIGNING MASK
GRUENING ULRIKE, EFFERENN DIRK, WICH GLASEN ANDREAS, RADECKER JOERG, MOLL HANS PETER
Year of Publication 06.03.2003
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Year of Publication 06.03.2003
Patent