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Year of Publication 26.07.2017
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Published in Solid state phenomena (01.09.2014)
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Journal Article
METHOD AND DEVICE FOR TREATING THE UNDERSIDE OF A SUBSTRATE
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Year of Publication 24.10.2018
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METHOD AND DEVICE FOR TREATING THE UNDERSIDE OF A SUBSTRATE
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Year of Publication 16.11.2017
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METHOD AND DEVICE FOR TREATING THE UNDERSIDE OF A SUBSTRATE
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Year of Publication 04.10.2017
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METHOD AND DEVICE FOR ETCHING BACK A SEMICONDUCTOR LAYER
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Year of Publication 01.08.2012
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Process and device for the treatment of the substrate
QUEISSER, STEFFEN, GANTER, PATRICK, WEISE, KATRIN, SANDER, BERND-UWE, PEDIADITAKIS, STEPHAN ALEXIS
Year of Publication 01.02.2020
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Year of Publication 01.02.2020
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Method and device for treating the underside of a substrate
PEDIADITAKIS STEPHAN ALEXIS, WEISE KATRIN, QUEISSER STEFFEN, SANDER BERND-UWE, GANTER PATRICK
Year of Publication 29.08.2017
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Year of Publication 29.08.2017
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METHOD AND DEVICE FOR TREATING THE UNDERSIDE OF A SUBSTRATE
PEDIADITAKIS, STEPHAN, ALEXIS, QUEISSER, STEFFEN, GANTER, PATRICK, WEISE, KATRIN, SANDER, BERND-UWE
Year of Publication 02.06.2016
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Year of Publication 02.06.2016
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Verfahren und Vorrichtung zur unterseitigen Behandlung eines Substrats
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Year of Publication 25.05.2016
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Year of Publication 25.05.2016
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TWI426558B
DELAHAYE, FRANCK, QUEISSER, STEFFEN, WEFRINGHAUS, ECKHARD, SAULE, WERNER
Year of Publication 11.02.2014
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Year of Publication 11.02.2014
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