Remote plasma architecture for true radical processing
VARADARAJAN, BHADRI, QIU, HUATAN, HOHN, GEOFFREY, DURBIN, AARON, GONG, BO, MILLER, AARON BLAKE, BREILING, PATRICK G, BHIMARASETTI, GOPINATH, BATZER, RACHEL E
Year of Publication 16.06.2022
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Year of Publication 16.06.2022
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Method of coating chamber components and operating reaction chambers
QIU, HUATAN, HOHN, GEOFFREY, SHANBHAG, DAMODAR, BRENINGER, ANDREW H, BAMFORD, THADEOUS, GONG, BO, CHANDRASHEKAR, ANAND, BAILEY, CURTIS WARREN, LIU, GANG, KHARE, ROHIT, KHO, LEONARD WAI FUNG, SCHLOSSER, WILLIAM, LAI, FENGYUAN, YUAN, GUANGBI, KAUSHAL, TONY, BIRRU, KRISHNA, HSU, CHEN HUA
Year of Publication 01.03.2023
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Year of Publication 01.03.2023
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High density plasma etchback process for advanced metallization applications
PARK KIEJIN, ZHOU CHUNMING, KUO EMERY, WU LIQI, QIU HUATAN, COLINJIVADI KARTHIK
Year of Publication 30.04.2013
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Year of Publication 30.04.2013
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CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY
KARIM ISHTAK, ZHOU CHUNMING, WU LIQI, QIU HUATAN, PARK KIE-JIN, COLINJIVADI KARTHIK
Year of Publication 13.09.2012
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Year of Publication 13.09.2012
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HIGH DENSITY PLASMA ETCHBACK PROCESS FOR ADVANCED METALLIZATION APPLICATIONS
PARK KIEJIN, ZHOU CHUNMING, KUO EMERY, WU LIQI, QIU HUATAN, COLINJIVADI KARTHIK
Year of Publication 21.06.2012
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Year of Publication 21.06.2012
Patent
CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY
KARIM ISHTAK, ZHOU CHUNMING, WU LIQI, QIU HUATAN, PARK KIE-JIN, COLINJIVADI KARTHIK
Year of Publication 22.03.2012
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Year of Publication 22.03.2012
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EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
CHANDRASHEKAR ANAND, KAUSHAL TONY, BIRRU KRISHNA, SCHLOSSER WILLIAM, LIU GANG, HSU CHEN-HUA, QIU HUATAN, KHARE ROHIT, YUAN GUANGBI, HOHN GEOFFREY, KHO LEONARD WAI FUNG, BAILEY CURTIS WARREN, BRENINGER ANDREW H, GONG BO, LAI FENGYUAN, BAMFORD THADEOUS, SHANBHAG DAMODAR
Year of Publication 24.11.2020
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Year of Publication 24.11.2020
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