Search Results - "Putna, Ernisse S." :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Process integration and future outlook of 2D transistors

Process integration and future outlook of 2D transistors

by O’Brien, Kevin P., Naylor, Carl H., Dorow, Chelsey, Maxey, Kirby, Penumatcha, Ashish Verma, Vyatskikh, Andrey, Zhong, Ting, Kitamura, Ande, Lee, Sudarat, Rogan, Carly, Mortelmans, Wouter, Kavrik, Mahmut Sami, Steinhardt, Rachel, Buragohain, Pratyush, Dutta, Sourav, Tronic, Tristan, Clendenning, Scott, Fischer, Paul, Putna, Ernisse S., Radosavljevic, Marko, Metz, Matt, Avci, Uygar
Published in Nature communications (12.10.2023)

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Journal Article

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY(DSA) FOR BACK END OF LINE(BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY(DSA) FOR BACK END OF LINE(BEOL) PATTERN CUTTING AND PLUGGING

by SIVAKUMAR SWAMINATHAN, HAN EUNGNAK, NYHUS PAUL A, PUTNA ERNISSE S
Year of Publication 03.06.2016

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Patent

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

by BLACKWELL JAMES M, HOURANI RAMI, KRYSAK MARIE, LEESON MICHAEL J, YOUNKIN TODD R, HAN EUNGNAK, PUTNA ERNISSE S, BRISTOL ROBERT L
Year of Publication 01.09.2017

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Patent

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

by Sivakumar, Swaminathan, Han, Eungnak, Nyhus, Paul A, Putna, Ernisse S
Year of Publication 29.10.2019

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Patent

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

by Han Eungnak, Putna Ernisse S, Nyhus Paul A, Sivakumar Swaminathan
Year of Publication 20.07.2017

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Patent

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

by HAN, Eungnak, NYHUS, Paul A, PUTNA, Ernisse S, SIVAKUMAR, Swaminathan
Year of Publication 26.04.2017

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Patent

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

by Han Eungnak, Putna Ernisse S, Nyhus Paul A, Sivakumar Swaminathan
Year of Publication 18.04.2017

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Patent

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

by NYHUS, PAUL A, SIVAKUMAR, SWAMINATHAN, PUTNA, ERNISSE S, HAN, EUNGNAK
Year of Publication 03.08.2016

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Patent

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

by SIVAKUMAR SWAMINATHAN, HAN EUNGNAK, NYHUS PAUL A, PUTNA ERNISSE S
Year of Publication 02.04.2015

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Patent

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA) FOR BACK END OF LINE (BEOL) PATTERN CUTTING AND PLUGGING

by NYHUS, PAUL A, SIVAKUMAR, SWAMINATHAN, PUTNA, ERNISSE S, HAN, EUNGNAK
Year of Publication 02.04.2015

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Patent

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

by BRISTOL, Robert L, HAN, Eungnak, YOUNKIN, Todd R, LEESON, Michael J, BLACKWELL, James M, KRYSAK, Marie, PUTNA, Ernisse S, HOURANI, Rami
Year of Publication 22.08.2018

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Patent

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

by KRYSAK Marie, PUTNA Ernisse S, BRISTOL Robert L, HOURANI Rami, HAN Eungnak, BLACKWELL James M, YOUNKIN Todd R, LEESON Michael J
Year of Publication 30.11.2017

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Patent

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

by BRISTOL, Robert L, HAN, Eungnak, YOUNKIN, Todd R, LEESON, Michael J, BLACKWELL, James M, KRYSAK, Marie, PUTNA, Ernisse S, HOURANI, Rami
Year of Publication 01.11.2017

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Patent

Resist compounds including acid labile groups having hydrophilic groups attached thereto

Resist compounds including acid labile groups having hydrophilic groups attached thereto

by YUEH WANG, PUTNA ERNISSE S
Year of Publication 12.12.2006

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Patent

Resist compounds including acid labile groups having hydrophilic groups attached thereto

Resist compounds including acid labile groups having hydrophilic groups attached thereto

by Yueh, Wang, Putna, Ernisse S
Year of Publication 12.12.2006

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Patent

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

PHOTODEFINABLE ALIGNMENT LAYER FOR CHEMICAL ASSISTED PATTERNING

by HOURANI, RAMI, BLACKWELL, JAMES M, PUTNA, ERNISSE S, LEESON, MICHAEL J, HAN, EUNGNAK, YOUNKIN, TODD R, KRYSAK, MARIE, BRISTOL, ROBERT L
Year of Publication 30.06.2016

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Patent

Resist compounds including acid labile groups having hydrophilic groups attached thereto

Resist compounds including acid labile groups having hydrophilic groups attached thereto

by YUEH WANG, PUTNA ERNISSE S
Year of Publication 06.10.2005

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Patent

Exposure activated chemically amplified directed self-assembly (dsa) for back end of line (beol) pattern cutting and plugging

Exposure activated chemically amplified directed self-assembly (dsa) for back end of line (beol) pattern cutting and plugging

by NYHUS, PAUL A, SIVAKUMAR, SWAMINATHAN, PUTNA, ERNISSE S, HAN, EUNGNAK
Year of Publication 11.05.2017

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Patent

Reducing outgassing of reactive material upon exposure of photolithography resists

Reducing outgassing of reactive material upon exposure of photolithography resists

by YUEH WANG, PUTNA ERNISSE S
Year of Publication 21.07.2005

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Patent

Methods and compositions for providing photoresist with improved properties for contacting liquids

Methods and compositions for providing photoresist with improved properties for contacting liquids

by Meagley, Robert P, Putna, Ernisse S, Yueh, Wang
Year of Publication 16.03.2010

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Patent