Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
Kukli, Kaupo, Aarik, Jaan, Ritala, Mikko, Uustare, Teet, Sajavaara, Timo, Lu, Jun, Sundqvist, Jonas, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku
Published in Journal of applied physics (01.11.2004)
Published in Journal of applied physics (01.11.2004)
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Hole traps and thermoluminescence in Li2B4O7:Be
Kerikmäe, Mihkel, Danilkin, Mikhail, Lust, Aime, Nagirnyi, Vitali, Pung, Lembit, Ratas, Arno, Romet, Ivo, Seeman, Viktor
Published in Radiation measurements (01.09.2013)
Published in Radiation measurements (01.09.2013)
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Conference Proceeding
Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature
Kukli, Kaupo, Aarik, Jaan, Uustare, Teet, Lu, Jun, Ritala, Mikko, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku, Kikas, Arvo, Sammelselg, Väino
Published in Thin solid films (23.05.2005)
Published in Thin solid films (23.05.2005)
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Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]
Kukli, Kaupo, Aarik, Jaan, Ritala, Mikko, Uustare, Teet, Sajavaara, Timo, Lu, Jun, Sundqvist, Jonas, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku
Published in Journal of applied physics (01.05.2005)
Published in Journal of applied physics (01.05.2005)
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Journal Article
Erratum: Effect of selected atomic layer deposition parameterson the structure and dielectric properties of hafnium oxide films[ J. Appl. Phys. 96 , 5298 ( 2004 ) ]
Kukli, Kaupo, Aarik, Jaan, Ritala, Mikko, Uustare, Teet, Sajavaara, Timo, Lu, Jun, Sundqvist, Jonas, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku
Published in Journal of applied physics (21.04.2005)
Published in Journal of applied physics (21.04.2005)
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