A measurement system for the photoelectric and electrical characterization of modern semiconductor devices
Piskorski, K, Niemiec, M, Borowicz, L, Przewlocki, H M
Published in Measurement science & technology (01.05.2017)
Published in Measurement science & technology (01.05.2017)
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Journal Article
Photoelectrical measurements of the local value of the contact potential difference in the metal–insulator semiconductor (MIS) structures
Kudla, A., Przewlocki, H.M., Borowicz, L., Brzezinska, D., Rzodkiewicz, W.
Published in Thin solid films (22.02.2004)
Published in Thin solid films (22.02.2004)
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Journal Article
Conference Proceeding
Effect of oxygen on tuning the TiNx metal gate work function on LaLuO3
Mitrovic, I.Z., Przewlocki, H.M., Piskorski, K., Simutis, G., Dhanak, V.R., Sedghi, N., Hall, S.
Published in Thin solid films (30.09.2012)
Published in Thin solid films (30.09.2012)
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Journal Article
Investigation of gate edge effect on interface trap density in 3C–SiC MOS capacitors
Gutt, T., Małachowski, T., Przewłocki, H.M., Engström, O., Bakowski, M., Esteve, R.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.09.2012)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.09.2012)
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Journal Article
Internal photoemission technique for high-k oxide/semiconductor band offset determination: The influence of semiconductor bulk properties
Engstrom, Olof, Przewlocki, Henryk M., Mitrovic, Ivona Z., Hall, Stephen
Published in 2014 44th European Solid State Device Research Conference (ESSDERC) (01.09.2014)
Published in 2014 44th European Solid State Device Research Conference (ESSDERC) (01.09.2014)
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Conference Proceeding
Distribution of the contact-potential difference local values over the gate area of MOS structures
Przewlocki, Henryk M., Kudla, Andrzej, Brzezinska, Danuta, Massoud, Hisham Z.
Published in Microelectronic engineering (01.04.2004)
Published in Microelectronic engineering (01.04.2004)
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Journal Article
Conference Proceeding
A photoelectric method to determine lateral distribution of the effective contact potential difference in MOS structures
Kudla, A., Borowicz, L., Przewlocki, H.M.
Published in Proceedings of the 21st IEEE Instrumentation and Measurement Technology Conference (IEEE Cat. No.04CH37510) (2004)
Published in Proceedings of the 21st IEEE Instrumentation and Measurement Technology Conference (IEEE Cat. No.04CH37510) (2004)
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Conference Proceeding