Bistable behavior of silicon wafer in rapid thermal processing setup
Rudakov, V.I., Ovcharov, V.V., Kurenya, A.L., Prigara, V.P.
Published in Microelectronic engineering (01.05.2012)
Published in Microelectronic engineering (01.05.2012)
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Journal Article
Temperature bistability in a silicon wafer with a doped layer on lamp-based heating
Prigara, V.P., Ovcharov, V.V., Rudakov, V.I.
Published in Materials science in semiconductor processing (01.06.2015)
Published in Materials science in semiconductor processing (01.06.2015)
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Journal Article
Effect of the doping level on temperature bistability in a silicon wafer
Ovcharov, V. V., Rudakov, V. I., Prigara, V. P., Kurenya, A. L.
Published in Technical physics (01.08.2014)
Published in Technical physics (01.08.2014)
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Journal Article
Bistable behavior of silicon wafer in rapid thermal processing setup
RUDAKOV, V. I, OVCHAROV, V. V, KURENYA, A. L, PRIGARA, V. P
Published in Microelectronic engineering (2012)
Get full text
Published in Microelectronic engineering (2012)
Journal Article