Search Results - "Polomoff Nicholas A" :: K.UTB vyhledávací portál

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Laser etching system including mask reticle for multi-depth etching

by TESSLER, CHRISTOPHER L, POLOMOFF, NICHOLAS A, SOUTER, MATTHEW E, ERWIN, BRIAN M
Year of Publication 16.03.2016

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Method of ablating energy-sensitive layer formed on at least one embedded feature of workpiece, and ablation system

by TESSLER, CHRISTOPHER L, POLOMOFF, NICHOLAS A, SHEETS, COURTNEY T, SOUTER, MATTHEW E, LEENSTRA, BOUWE W, ERWIN, BRIAN M
Year of Publication 01.08.2016

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Patent

Laser etching system including mask reticle for multi-depth etching

Method of ablating energy-sensitive layer formed on at least one embedded feature of workpiece, and ablation system

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