Metal-containing Materials as Turning Point of EUV Lithography
Simone, Danilo De, Pollentier, Ivan, Vandenberghe, Geert
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
Photoresist Absorption Measurement at Extreme Ultraviolet (EUV) Wavelength by Thin Film Transmission Method
Shehzad, Atif, Vesters, Yannick, Simone, Danilo De, Pollentier, Ivan, Nannarone, Stefano, Vandenberghe, Geert, Gendt, Stefan De
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Journal Article
High Throughput Grating Qualification for Rating Directed Self-Assembly Pattern Performance using Optical Metrology
Gronheid, Roel, Look, Lieve Van, Delgadillo, Paulina Rincon, Pollentier, Ivan, Gao, Yi, Lin, Guanyang, Nealey, Paul F.
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Assessment of Challenges in EUV Resist Outgassing and Contamination Characterization
Pollentier, Ivan, Lokasani, Ragava, Gronheid, Roel
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
Goethals, Anne-Marie, Foubert, Philippe, Hosokawa, Kohei, Roey, Frieda Van, Niroomand, Ardavan, Heuvel, Dieter Van den, Pollentier, Ivan
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program
Hendrickx, Eric, Gronheid, Roel, Hermans, Jan, Lorusso, Gian, Foubert, Philippe, Pollentier, Ivan, Goethals, Anne-Marie, Jonckheere, Rik, Vandenberghe, Geert, Ronse, Kurt
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.
Published in Journal of materials chemistry (01.01.2011)
Published in Journal of materials chemistry (01.01.2011)
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Journal Article
Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Lodha, Jayant K., Pollentier, Ivan, Conard, Thierry, Vallat, Remi, De Gendt, Stefan, Armini, Silvia
Published in Applied surface science (30.12.2022)
Published in Applied surface science (30.12.2022)
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Journal Article
SIMS Analysis of Thin EUV Photoresist Films
Spampinato, Valentina, Franquet, Alexis, De Simone, Danilo, Pollentier, Ivan, Pirkl, Alexander, Oka, Hironori, van der Heide, Paul
Published in Analytical chemistry (Washington) (08.02.2022)
Published in Analytical chemistry (Washington) (08.02.2022)
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Journal Article
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish, Pollentier, Ivan, Singh, Harpreet, Fallica, Roberto, De Simone, Danilo, De Gendt, Stefan
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (07.05.2020)
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (07.05.2020)
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Journal Article
Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Rathore, Ashish, Pollentier, Ivan, Cipriani, Maicol, Singh, Harpreet, De Simone, Danilo, Ingólfsson, Oddur, De Gendt, Stefan
Published in ACS applied polymer materials (09.04.2021)
Published in ACS applied polymer materials (09.04.2021)
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Journal Article
EUVL A METHOD FOR FORMING AN EUVL PELLICLE
SCHAPMANS ELIE, HUYGHEBAERT CEDRIC, TIMMERMANS MARINA, POLLENTIER IVAN, GALLAGHER EMILY
Year of Publication 02.07.2021
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Year of Publication 02.07.2021
Patent
Correction: Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish, Pollentier, Ivan, Singh, Harpreet, Fallica, Roberto, De Simone, Danilo, De Gendt, Stefan
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (07.05.2020)
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (07.05.2020)
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Journal Article
Challenges in scaling of CMOS devices towards 65 nm node
Małgorzata Jurczak, Ivan Pollentier, Simone Severi, Kirklen Henson, Anne Lauwers, Richard Lindsay, Marc Scaekers, Aude Rotschild, Sofie Mertens, Emmanuel Augendre, Rita Rooyackers, Anabela Veloso, An de Keersgieter
Published in Journal of Telecommunications and Information Technology (30.03.2005)
Published in Journal of Telecommunications and Information Technology (30.03.2005)
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Journal Article
EUVL AN EUVL SCANNER
FRANKE JOERN HOLGER, TIMMERMANS MARINA, POLLENTIER IVAN, MARIANO JUSTE MARINA, GALLAGHER EMILY
Year of Publication 09.07.2020
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Year of Publication 09.07.2020
Patent
EUV Induced stress for EUV pellicle tensioning
HUYGHEBAERT CEDRIC, TIMMERMANS MARINA, POLLENTIER IVAN, MARIANO JUSTE MARINA, GALLAGHER EMILY
Year of Publication 01.07.2020
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Year of Publication 01.07.2020
Patent
High throughput grating qualification of directed self-assembly patterns using optical metrology
VAN LOOK, Lieve, DELGADILLO, Paulina Rincon, LEE, Yu-Tsung, POLLENTIER, Ivan, GRONHEID, Roel, YI CAO, GUANYANG LIN, NEALEY, Paul F
Published in Microelectronic engineering (01.07.2014)
Published in Microelectronic engineering (01.07.2014)
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Conference Proceeding
Journal Article
Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists
Lawrie, Kirsten, Blakey, Idriss, Blinco, James, Gronheid, Roel, Jack, Kevin, Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.
Published in Radiation physics and chemistry (Oxford, England : 1993) (01.02.2011)
Published in Radiation physics and chemistry (Oxford, England : 1993) (01.02.2011)
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Journal Article
Readiness of EUV Lithography for Insertion into Manufacturing
Hendrickx, Eric, Gronheid, Roel, Hermans, Jan, Lorusso, Gian, Foubert, Philippe, Pollentier, Ivan, Goethals, Anne-Marie, Jonckheere, Rik, Vandenberghe, Geert, Ronse, Kurt
Published in Journal of photopolymer science and technology (01.09.2013)
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Published in Journal of photopolymer science and technology (01.09.2013)
Journal Article