Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors
Mulaosmanovic, Halid, Ocker, Johannes, Müller, Stefan, Schroeder, Uwe, Müller, Johannes, Polakowski, Patrick, Flachowsky, Stefan, van Bentum, Ralf, Mikolajick, Thomas, Slesazeck, Stefan
Published in ACS applied materials & interfaces (01.02.2017)
Published in ACS applied materials & interfaces (01.02.2017)
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Journal Article
Impact of different dopants on the switching properties of ferroelectric hafniumoxide
Schroeder, Uwe, Yurchuk, Ekaterina, Müller, Johannes, Martin, Dominik, Schenk, Tony, Polakowski, Patrick, Adelmann, Christoph, Popovici, Mihaela I., Kalinin, Sergei V., Mikolajick, Thomas
Published in Japanese Journal of Applied Physics (01.08.2014)
Published in Japanese Journal of Applied Physics (01.08.2014)
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Journal Article
Doped Hafnium Oxide – An Enabler for Ferroelectric Field Effect Transistors
Müller, Stefan, Polakowski, Patrick, Schenk, Tony, van Bentum, Ralf, Yurchuk, Ekaterina, Müller, Johannes, Slesazeck, Stefan, Mikolajick, Thomas, Schroeder, Uwe, Flachowsky, Stefan, Kolodinski, Sabine
Published in Advances in Science and Technology (31.10.2014)
Published in Advances in Science and Technology (31.10.2014)
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Journal Article
Ferroelectric HfO2 thin film testing and whole wafer mapping with non-contact corona-Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Muller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Ferroelectric HfO 2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology (Phys. Status Solidi A 7∕2017)
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Ferroelectric HfO 2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
(Invited) Integration Challenges of Ferroelectric Hafnium Oxide Based Embedded Memory
Müller, Johannes, Polakowski, Patrick, Paul, Jan, Riedel, Stefan, Hoffmann, Raik, Drescher, Maximilian, Slesazeck, Stefan, Müller, Stefan, Mulaosmanovic, Halid, Schröder, Uwe, Mikolajick, Thomas, Flachowsky, Stefan, Erben, Elke, Smith, Elliot, Binder, Robert, Triyoso, Dina, Metzger, Joachim, Kolodinski, Sabine
Published in ECS transactions (09.09.2015)
Published in ECS transactions (09.09.2015)
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Journal Article
ALD ZrO2 processes for BEoL device applications
Weinreich, Wenke, Seidel, Konrad, Polakowski, Patrick, Riedel, Stefan, Wilde, Lutz, Triyoso, Dina H., Nolan, Mark G.
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
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