Effect of Mask Geometry Variation on Plasma Etching Profiles
Bobinac, Josip, Reiter, Tobias, Piso, Julius, Klemenschits, Xaver, Baumgartner, Oskar, Stanojevic, Zlatan, Strof, Georg, Karner, Markus, Filipovic, Lado
Published in Micromachines (Basel) (16.03.2023)
Published in Micromachines (Basel) (16.03.2023)
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Journal Article
Physics-Informed Compact Model for SF6/O2 Plasma Etching
Filipovic, Lado, Bobinac, Josip, Piso, Julius, Reiter, Tobias
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
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Conference Proceeding
DTCO flow for air spacer generation and its impact on power and performance at N7
Filipovic, Lado, Baumgartner, Oskar, Klemenschits, Xaver, Piso, Julius, Bobinac, Josip, Reiter, Tobias, Strof, Georg, Rzepa, Gerhard, Stanojevic, Zlatan, Karner, Markus
Published in Solid-state electronics (01.01.2023)
Published in Solid-state electronics (01.01.2023)
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Journal Article