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Year of Publication 25.07.2023
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Year of Publication 13.08.2015
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Year of Publication 12.07.2022
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Year of Publication 25.01.2022
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Integration of dual remote plasmas sources for flowable CVD
YIZHEN ZHANG, YING MA, DONGQING LI, JAY D. PINSON, II, JINGMEI LIANG, DAEMIAN RAJ
Year of Publication 05.06.2018
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Year of Publication 05.06.2018
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METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM
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Year of Publication 18.02.2016
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Year of Publication 18.02.2016
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Methods of directing magnetic fields in a plasma source, and associated systems
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Year of Publication 17.08.2016
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Year of Publication 03.11.2022
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Year of Publication 27.10.2022
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Year of Publication 27.10.2022
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Batch curing chamber with gas distribution and individual pumping
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Year of Publication 09.08.2022
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Year of Publication 09.08.2022
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Magnetic-material shield around plasma chambers near pedestal
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Year of Publication 14.05.2024
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Year of Publication 14.05.2024
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Electrode assembly
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Year of Publication 20.04.2021
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Year of Publication 20.04.2021
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Integration of dual remote plasmas sources for flowable CVD
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Year of Publication 02.03.2021
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Year of Publication 02.03.2021
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PLASMA CLEANING METHODS FOR PROCESSING CHAMBERS
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Year of Publication 09.12.2021
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Year of Publication 09.12.2021
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