Defectivity readiness for immersion scanner qualification towards 32nm production
van der Sijs, Arjan, Stegen, Raf, van Dommelen, Youri, der Kinderen, Ted, van Brederode, Erik, Duray, Frank, Englard, Ilan, Masia, Claudio, Piech, Rich, Ravid, Erez, Rotlevi, Ofer, Hillel, Noam
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
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Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Conference Proceeding
Novel CD-SEM Overlay Method: Improves Dual Trench Patterning CDU
Englard, Ilan, Piech, Rich, Gershtein, Liraz, Peltinov, Ram, Adan, Ofer
Published in Semiconductor International (01.02.2008)
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Published in Semiconductor International (01.02.2008)
Trade Publication Article