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Published in ECS transactions (20.07.2018)
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Analysis of interface impurities in electroplated Cu layers by using GD-OES and TOF-SIMS
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Published in Surface and interface analysis (01.03.2008)
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Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Advantages of Faceted P-Raised Source/Drain in Fully Depleted Silicon on Insulator Technology
Aydin, Ömür Işıl, Holt, Judson Robert, Vanamurthy, Laks, Feudel, Thomas, Le Royer, Cyrille, Heyne, Tobias, Gerber, Ralf, Lenski, Markus, Mulfinger, George Robert, McArdle, Timothy J, Jansen, Sören, Utess, Dirk, Klein, Christoph, Peeva, Anita, Barge, David, Divay, Alexis, Lehmann, Steffen, Smith, Elliot, Peters, Carsten, Sachse, Jens-Uwe
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
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Journal Article
Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO 4 Gate Dielectrics for 32nm High Performance Logic CMOS SOI Technologies
Kelwing, Torben, Naumann, Andreas, Trentzsch, Martin, Mutas, Sergej, Trui, Bernhard, Herrmann, Lutz, Graetsch, Falk, Klein, Christoph, Wilde, Lutz, Ohsiek, Susanne, Weisheit, Martin, Peeva, Anita, Richter, Inka, Prinz, Hartmut, Wuerfel, Alexander, Carter, Rick, Stephan, Rolf, Kücher, Peter, Hansch, Walter
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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