Search Results - "Pavelescu, C." :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Thoracoscopic left splanchnicectomy - role in pain control in unresectable pancreatic cancer. Initial experience

Thoracoscopic left splanchnicectomy - role in pain control in unresectable pancreatic cancer. Initial experience

by Lică, I, Jinescu, G, Pavelescu, C, Beuran, M
Published in Chirurgia (Bucharest, Romania : 1990) (01.05.2014)

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Risk of malignancy in complex cystic renal masses (Bosniak category III-IV)

Risk of malignancy in complex cystic renal masses (Bosniak category III-IV)

by Mirvald, C, Pavelescu, C, Surcel, C, Mihai, V, Najjar, S, Cerempei, V, Savu, C, Sinescu, I
Published in European urology supplements : official journal of the European Association of Urology (01.12.2016)

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Robotic assisted cystoprostatectomy (RARC) in the management of muscle invasive bladder cancer – a critical assessment over the last 10 years

Robotic assisted cystoprostatectomy (RARC) in the management of muscle invasive bladder cancer – a critical assessment over the last 10 years

by Mirvald, C, Surcel, C, Gianluca, G, Pavelescu, C, Mihai, V, Najjar, S, Cerempei, V, Savu, C, Sinescu, I
Published in European urology supplements : official journal of the European Association of Urology (01.10.2015)

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Management of oligo-recurrent prostate cancer: Is salvage super extended pelvic lymphadenectomy an option?

Management of oligo-recurrent prostate cancer: Is salvage super extended pelvic lymphadenectomy an option?

by Surcel, C, Mirvald, C, Mihai, V, Pavelescu, C, Najjar, S, Gingu, C, Manu, M.A, Cerempei, V, Sau, C, Sinescu, I
Published in European urology supplements : official journal of the European Association of Urology (01.10.2015)

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C134: Early complication rates and perioperative mortality after radical cystectomy in the elderly

C134: Early complication rates and perioperative mortality after radical cystectomy in the elderly

by Mirvald, C, Surcel, C, Gingu, C, Pavelescu, C, Cerempei, V, Najjar, S, Olaru, V, Chirita, M, Savu, C, Gluck, G, Sinescu, I
Published in European urology supplements : official journal of the European Association of Urology (01.11.2014)

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Etch rate behaviour of phosphosilicate glass films chemically vapour deposited in the SiH4PH3O2N2 system at low temperature

Etch rate behaviour of phosphosilicate glass films chemically vapour deposited in the SiH4PH3O2N2 system at low temperature

by Pavelescu, C., Cobianu, C.
Published in Thin solid films (15.02.1991)

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1 MHz dielectric constants of phosphosilicate glass films chemically vapour-deposited in the SiH4-PH3-O2-N2 system at low temperature

1 MHz dielectric constants of phosphosilicate glass films chemically vapour-deposited in the SiH4-PH3-O2-N2 system at low temperature

by Pavelescu, C., Serghi, D.
Published in Journal of materials science (1992)

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A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films

A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films

by Cobianu, C., Pavelescu, C.
Published in Journal of the Electrochemical Society (01.09.1983)

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D.c. dielectric breakdown in SiO2 films prepared by low temperature chemical vapour deposition

D.c. dielectric breakdown in SiO2 films prepared by low temperature chemical vapour deposition

by Cobianu, C., Pavelescu, C.
Published in Thin solid films (01.10.1986)

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Journal Article

Breakdown of SiO2 thin films grown in dry O2

Breakdown of SiO2 thin films grown in dry O2

by Badila, M., Pavelescu, C., Popa, O.
Published in Thin solid films (01.11.1990)

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Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

by Cobianu, C., Pavelescu, C.
Published in Thin solid films (29.04.1983)

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An etch rate study on thermally annealed SiO2 films deposited in a TEOS-LPCVD system

An etch rate study on thermally annealed SiO2 films deposited in a TEOS-LPCVD system

by Orfescu, C., Pavelescu, C., Badila, M.
Published in Journal of materials science (01.02.1990)

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Silane oxidation study: analysis of data for SiO2 films deposited by low temperature chemical vapour deposition

Silane oxidation study: analysis of data for SiO2 films deposited by low temperature chemical vapour deposition

by COBIANU, C, PAVELESCU, C
Published in Thin solid films (20.07.1984)

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A study of the properties of low temperature chemically vapour deposited phosphosilicate glass films

A study of the properties of low temperature chemically vapour deposited phosphosilicate glass films

by Pavelescu, C., Cobianu, C., Vlahovici, N., Ghita, C.
Published in Thin solid films (01.07.1988)

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High frequency C-V investigation of metal-oxide-semiconductor capacitors prepared by low temperature subatmospheric pressure chemical vapour deposition of SiO2 films on silicon substrates

High frequency C-V investigation of metal-oxide-semiconductor capacitors prepared by low temperature subatmospheric pressure chemical vapour deposition of SiO2 films on silicon substrates

by PAVELESCU, C, MCVITTIE, J. P, CHANG, C, SARASWAT, K. C, LEONG, J. Y
Published in Thin solid films (30.09.1992)

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Thermally annealed phosphosilicate glass films deposited in the SiH4-PH3-O2-N2 system

Thermally annealed phosphosilicate glass films deposited in the SiH4-PH3-O2-N2 system

by BANTOIU, R, PAVELESCU, C
Published in Journal of materials science letters (01.12.1990)

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An infrared absorption study of LTCVD silicon dioxide

An infrared absorption study of LTCVD silicon dioxide

by PAVELESCU, C, COBIANU, C, VANCU, A
Published in Journal of the Electrochemical Society (01.01.1983)

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Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2 films: the effect of O2/SiH4 mole ratio

Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2 films: the effect of O2/SiH4 mole ratio

by Pavelescu, C., Cobianu, C.
Published in Journal of materials science letters (01.02.1990)

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On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

by COBIANU, C, PAVELESCU, C, SEGAL, E
Published in Thin solid films (16.01.1987)

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Thermodynamic investigations of the gas phase reaction of SiH4 and O2 at atmospheric pressure

Thermodynamic investigations of the gas phase reaction of SiH4 and O2 at atmospheric pressure

by PAVELESCU, C, COBIANU, C, SEGAL, E
Published in Thin solid films (01.07.1986)

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