A review of line edge roughness and surface nanotexture resulting from patterning processes
Gogolides, Evangelos, Constantoudis, Vassilios, Patsis, George P., Tserepi, Angeliki
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Electron-beam lithography simulation for the fabrication of EUV masks
Patsis, George P., Tsikrikas, Nikos, Raptis, Ioanis, Glezos, Nikos
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
Patsis, George P., Constantoudis, Vasilios, Tserepi, Angeliki, Gogolides, Evangelos, Grozev, Grozdan, Hoffmann, Thomas
Published in Microelectronic engineering (01.06.2003)
Published in Microelectronic engineering (01.06.2003)
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Journal Article
Conference Proceeding
Room temperature analysis of Ge p+/n diodes reverse characteristics fabricated by platinum assisted dopant activation
Ioannou-Sougleridis, Vassilios, Poulakis, Nikolaos, Dimitrakis, Panagiotis, Normand, Pascal, Patsis, George P., Dimoulas, Athanasios, Simoen, Eddy
Published in Solid-state electronics (01.03.2013)
Published in Solid-state electronics (01.03.2013)
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Journal Article
Fractal Roughness of Polymers after Lithographic Processing
Constantoudis, Vassilios, Gogolides, Evangelos, Patsis, George P., Sarris, Vassilios, Tserepi, Angeliki, Diakoumakos, Constantinos, Valamontes, Evangelos S.
Published in Japanese Journal of Applied Physics (01.01.2005)
Published in Japanese Journal of Applied Physics (01.01.2005)
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Journal Article
Stochastic Simulation of Material and Process Effects on the Patterning of Complex Layouts
Tsikrikas, Nikolaos, Drygiannakis, Dimitrios, Patsis, George P., Raptis, Ioannis, Stavroulakis, Stelios, Voyiatzis, Emmanuel
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article
Effects of lithography non-uniformity on device electrical behavior. Simple stochastic modeling of material and process effects on device performance
Patsis, George P., Constantoudis, Vassilios, Gogolides, Evangelos
Published in Journal of computational electronics (01.12.2006)
Published in Journal of computational electronics (01.12.2006)
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Journal Article
Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
EDER-KAPL, Stefan, LOESCHNER, Hans, ZEININGER, Michalea, FALLMANN, Wolfgang, KIRCH, Oliver, PATSIS, George P, CONSTANTOUDIS, V, GOGOLIDES, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Conference Proceeding
Journal Article
Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
Eder-Kapl, Stefan, Loeschner, Hans, Zeininger, Michalea, Fallmann, Wolfgang, Kirch, Oliver, Patsis, George P., Constantoudis, V., Gogolides, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Journal Article