Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications
Sung, Ho-Kun, Qiang, Tian, Yao, Zhao, Li, Yang, Wu, Qun, Lee, Hee-Kwan, Park, Bum-Doo, Lim, Woong-Sun, Park, Kyung-Ho, Wang, Cong
Published in Scientific reports (20.06.2017)
Published in Scientific reports (20.06.2017)
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