High-reflection Mo/Be/Si multilayers for EUV lithography
Chkhalo, Nikolai I, Gusev, Sergei A, Nechay, Andrey N, Pariev, Dmitry E, Polkovnikov, Vladimir N, Salashchenko, Nikolai N, Schäfers, Franz, Sertsu, Mewael G, Sokolov, Andrey, Svechnikov, Mikhail V, Tatarsky, Dmitry A
Published in Optics letters (15.12.2017)
Published in Optics letters (15.12.2017)
Get more information
Journal Article