Optimization of Plasma Polymerized Methylsilane process for 248 and 193 nm lithography applications
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Conference Proceeding
E-beam and duv exposure of RIE PCM two-layer systems
Weill, A., Avico, J.P., Panabiere, J.P., Amblard, G.
Published in Microelectronic engineering (1990)
Published in Microelectronic engineering (1990)
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Journal Article
Conference Proceeding