65 nm Device Manufacture Using Shaped E-Beam Lithography
Pain, Laurent, Jurdit, Murielle, Laplanche, Yves, Todeschini, Jérôme, Leininger, Hugues, Tourniol, Sonia, Faure, Romuald, Bossy, Xavier, Palla, Ramiro, Beverina, Alessio, Broekaart, Marcel, Judong, Fabienne, Brosselin, Karine, Depoyan, Linda, Friec, Yannick Le, Leverd, Francois, Jonghe, Veronique De, Josse, Emmanuelle, Hinsinger, Olivier, Brun, Philippe, Henry, Daniel, Woo, Michael, Stolk, Peter, Tavel, Brice, Arnaud, Franck
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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