Search Results - "PRASAD ABANESHWAR" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

by Prasad, Abaneshwar, Fotou, George, Li, Shoutian
Published in Journal of materials research (14.09.2013)

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Journal Article

On the observation of a new morphology in poly(arylene ether ether ketone). A further examination of the double endothermic behavior of poly(arylene ether ether ketone)

On the observation of a new morphology in poly(arylene ether ether ketone). A further examination of the double endothermic behavior of poly(arylene ether ether ketone)

by Marand, Herve, Prasad, Abaneshwar
Published in Macromolecules (01.11.1992)

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Journal Article

TRANSPARENT POROUS MATERIALS FOR CHEMICAL MECHANICAL POLISHING

TRANSPARENT POROUS MATERIALS FOR CHEMICAL MECHANICAL POLISHING

by PRASAD ABANESHWAR
Year of Publication 05.11.2015

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Patent

Study of the temperature dependence of isothermal spherulitic growth rate data for poly(pivalolactone) in blends with poly(vinylidene fluoride): a link between coherent secondary nucleation theory and mixing thermodynamics

Study of the temperature dependence of isothermal spherulitic growth rate data for poly(pivalolactone) in blends with poly(vinylidene fluoride): a link between coherent secondary nucleation theory and mixing thermodynamics

by Huang, Jiang, Prasad, Abaneshwar, Marand, Hervé
Published in Polymer (Guildford) (01.01.1994)

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Journal Article Conference Proceeding

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

by PRASAD ABANESHWAR
Year of Publication 18.12.2014

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Patent

Aromatic polyesters derived from 5,5′-disubstituted bis(m-phenylene) crown ethers

Aromatic polyesters derived from 5,5′-disubstituted bis(m-phenylene) crown ethers

by Gibson, Harry W., Nagvekar, Devdatt S., Yamaguchi, Norimitsu, Delaviz, Yadollah, Jones, Jason W., Balanda, Peter, Prasad, Abaneshwar, Marand, Herve’
Published in Polymer (Guilford) (25.04.2018)

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Journal Article

CMP POROUS PAD WITH COMPONENT-FILLED PORES

CMP POROUS PAD WITH COMPONENT-FILLED PORES

by PRASAD ABANESHWAR
Year of Publication 07.08.2012

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Patent

Molecular organization of lignin during carbonization

Molecular organization of lignin during carbonization

by Davé, Vipul, Prasad, Abaneshwar, Marand, Hervé, Glasser, Wolfgang G.
Published in Polymer (Guilford) (01.01.1993)

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Journal Article

POLISHING PAD COMPRISING TRANSMISSIVE REGION

POLISHING PAD COMPRISING TRANSMISSIVE REGION

by NEWELL KELLY, PRASAD ABANESHWAR
Year of Publication 24.10.2013

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Patent

$Equilibrium dissolution temperature of low molecular weight polyethylene fractions in dilute solution$

Equilibrium dissolution temperature of low molecular weight polyethylene fractions in dilute solution

by Prasad, Abaneshwar, Mandelkern, Leo
Published in Macromolecules (01.02.1989)

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Journal Article

Synthesis and Properties of Cholesteryl Esters Bearing 32- and 16-Membered Crown Ethers

Synthesis and Properties of Cholesteryl Esters Bearing 32- and 16-Membered Crown Ethers

by Nagvekar, Devdatt S, Delaviz, Yadollah, Prasad, Abaneshwar, Merola, Joseph S, Marand, Herve, Gibson, Harry W
Published in Journal of organic chemistry (23.02.1996)

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Journal Article

TRANSPARENT MICROPOROUS MATERIALS FOR CMP

TRANSPARENT MICROPOROUS MATERIALS FOR CMP

by PRASAD, Abaneshwar
Year of Publication 30.01.2019

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Patent

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

by PRASAD, Abaneshwar
Year of Publication 05.07.2017

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Patent

CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO

CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO

by PRASAD Abaneshwar
Year of Publication 09.02.2017

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Patent

Analysis of Pre- and Post-Conditioned Polyurethane CMP Pad Surfaces as a Function of Conditioning Temperature

Analysis of Pre- and Post-Conditioned Polyurethane CMP Pad Surfaces as a Function of Conditioning Temperature

by Prasad, Abaneshwar, Xiang, Hongqi, Wang, Jianhua, Remsen, Edward E.
Published in ECS transactions (10.12.2007)

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Journal Article

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

by PRASAD, ABANESHWAR
Year of Publication 30.03.2016

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Patent

CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO

CMP POLISHING PAD WITH COLUMNAR STRUCTURE AND METHODS RELATED THERETO

by PRASAD, ABANESHWAR
Year of Publication 22.10.2015

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Patent

Polishing pad with light-stable light-transmitting region

Polishing pad with light-stable light-transmitting region

by PRASAD ABANESHWAR
Year of Publication 13.10.2015

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Patent

METHOD FOR MANUFACTURING MICROPOROUS CMP MATERIALS HAVING CONTROLLED PORE SIZE

METHOD FOR MANUFACTURING MICROPOROUS CMP MATERIALS HAVING CONTROLLED PORE SIZE

by PRASAD, ABANESHWAR
Year of Publication 15.04.2015

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Patent

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION

by PRASAD, ABANESHWAR
Year of Publication 18.03.2015

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Patent

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